Sample clues

5 across: The US president’s bird (3,5,3)

11 down: Group once known as the Quarrymen (7)

10 across: Cavalry sword (5)

19 across: Masonic ritual (5,6)

1 down: Pioneer of Ostpolitik (6)

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Sample clues

14 across: FDR’s baby (3,4)

1 down: A glitch in the Matrix? (4,2)

4 down: Slanted character (6)

5 down: New Year’s venue in New York (5,6)

16 down: Atmosphere of melancholy (5)

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Sample clues

6 across: Alejandro González Iñárritu’s breakthrough film (6,6)

19 across: Soft leather shoe (8)

7 down: Randroids, for example (12)

12 down: First American World Chess Champion (7)

17 down: Circle of influence (5)

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Sample clues

5 across: Robbie Robertson song about Richard Manuel (6,5)

2 down: F5 on a keyboard (7)

10 across: Lionel Richie hit (5)

3 down: ALTAIR, for example (5)

16 down: The problem with Florida 2000 (5)

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Sample clues

9 across: Van Morrison classic from Moondance (7)

6 down: Order beginning with ‘A’ (12)

6 across: Fatal weakness (8,4)

19 across: Rolling Stones classic (12)

4 down: Massacre tool (8)

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One reason for attending the upcoming Design Automation Conference (DAC 2015) is to learn about challenges other engineers have faced, and hear about their solutions. And the best place to do that is the Cadence Theater, located at the Cadence booth (#3515). The Theater will host continuous half-hour customer and partner presentations from 10:00 am Monday, June 8, to 5:30 pm Wednesday June 4.

As of this writing, 43 presentations are scheduled. This includes 17 customer presentations, 23 partner presentations, and 3 Cadence presentations, The presentations are open to all DAC attendees and no reservations are required.

Cadence customers who will be speaking include engineers from AMD, ams, Allegro Micro, Broadcom, IBM, Netspeed, NVidia, Renesas, Socionet, and STMicroelectronics. Partner presentations will be provided by ARM, Cliosoft, Dini Group, GLOBALFOUNDRIES, Methodics, Methods2Business, National Instruments, Samsung, TowerJazz, TSMC, and X-Fab.

These informal presentations are given in an interactive setting with an opportunity for questions and answers. Audio recordings with slides will be available at the Cadence web site after DAC. To access recordings of the 2014 DAC Theater presentations, click here.

This Cadence DAC Theater presentation drew a large audience at DAC 2015

Here’s a listing of the currently scheduled Cadence DAC Theater presentations. The latest schedule is available at the Cadence DAC 2015 site.

Monday, June 8

Tuesday, June 9

Wednesday, June 10

In a Wednesday session (June 10, 10:00 am) at the theater, the Cadence Academic Network will sponsor three talks on academic/industry collaboration models. Speakers are Dr. Zhou Li, architect, Cadence; Prof. Xin Li, Carnegie-Mellon University; and Prof. Laleh Behjat, University of Calgary.

As shown above, there will be a giveaways for a set of Bose noise-cancelling headphones, an iPad Mini, and a GoPro Hero3 video camera.

See the Cadence Theater schedule for further details. And be sure to view our Multimedia Site for live blogging and photos and videos from DAC. For a complete overview of Cadence activities at DAC, see our DAC microsite.

Richard Goering

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First, the good news. The EDA industry will grow from $6.2 billion in 2015 to $9.0 billion in 2019, according to Gary Smith, chief analyst at Gary Smith EDA. Year-to-year growth rates will range from +4% to +11.2%.

But in his annual presentation on the eve of the Design Automation Conference (DAC 2015), Smith noted that Wall Street is unimpressed. “The people I talk to want long-term steady growth, no sharp up-turns, no sharp downturns,” Smith said. “To the rest of Wall Street, we’re boring.”

Smith spent the rest of his talk noting how EDA can be a lot less boring and, potentially, a whole lot bigger. For starters, what if we add semiconductor IP to EDA revenues? Now we’re looking at $12.2 billion in revenue by 2019, Smith said. (He acknowledged, however, that the IP market itself is going to take a “dip” due to the move towards platform-based IP and away from conventional piecemeal IP).

This still is not enough to get Wall Street’s attention. Another possibility is to bring embedded software development into the EDA industry. This is not a huge market – about $2.6 billion today – but it is an “easy growth market for us,” according to Smith.

Chasing the Big Bucks

But the “big bucks” are in mechanical CAD (MCAD), Smith said. In the past the MCAD market has always been bigger than EDA, but now EDA is catching up. The MCAD market is about $6.6 billion now. Synopsys and Cadence are larger than PTC and Siemens, two of the main players in MCAD.

There may be some good acquisition possibilities coming up for EDA vendors, Smith said – and if we don’t buy MCAD companies, they might buy EDA companies. Consider, for example, that Ansoft bought Apache and Dassault bought Synchronicity. (Note: Siemens PLM Software is a first-time exhibitor at DAC 2015).

What about other domains? Smith said that EDA companies could conceivably move into optical design, applications development software, biomedical design, and chemical design. The last if these is probably the most tenuous; Smith noted that EDA vendors have yet to look into chemical design.

Applications development software is the biggest market on the above list, but that means competing with Microsoft, IBM, and Oracle. “You’re in with the big boys – is that a good idea?” Smith asked.

Perhaps there’s an opening for a “big play” for an MCAD provider. Smith noted that mechanical vendors are focusing on product data management (PDM). This “is really the IT of design,” Smith said. “They have a lot of hope that the IoT [Internet of things] market is going to give them an opportunity to capture the software that goes from the ground to the cloud. Maybe we can let them have PDM and see if we can take the tool market away from them, or acquire it away from them.”

In conclusion, Smith asked, should the EDA industry accelerate its growth? “The mechanical vendors have already shown interest in acquiring EDA vendors,” he said. “We may not have a choice.”

Richard Goering

NOTE: Catch our live blog from DAC 2015, beginning Monday morning, June 8! Click here

There has been so much hype about the “Internet of Things” (IoT) that it is refreshing to hear about a cutting-edge development project that can bring concrete benefits to millions of people. That project is the ongoing development of the Google Smart Contact Lens, and it was detailed in a keynote speech June 8 at the Design Automation Conference (DAC 2015).

The keynote speech was given by Brian Otis (right), a director at Google and a research associate professor at the University of Washington. The “smart lens” that the project envisions is essentially a disposable contact lens that fits on an eye and continuously monitors blood glucose levels. This is valuable information for anyone who has, or may someday have, diabetes.

Since he was speaking to an engineering audience, Otis focused on the challenges behind building such a device, and described some of the strategies taken by Google and its partner, Novartis. The project required new approaches to miniaturization, low-power design, and connectivity, as well as a comfortable and reliable silicon-to-human interface. Otis discussed the “why” as well and showed how the device could potentially save or improve millions of lives.

Millions of Users

First, a bit of background. Google announced the smart lens project in a blog post in January 2014. Since then it has been featured in news outlets including Forbes, Time, and the Wall Street Journal. In March 2015, Time reported that Google has been granted a patent for a smart contact lens.

The smart lens monitors the level of blood glucose by looking at its concentration in tears. The lens includes a wireless system on chip (SoC) and a miniaturized glucose sensor. A tiny pinhole in the lens allows tear fluid to seep into the sensor, and a wireless antenna handles communications to the wireless devices.

“We figure that if we can solve a huge problem, it is probably worth doing,” Otis said. “Diabetes is one example.” He noted 382 million people worldwide have diabetes today, and that 35% of the U.S. population may be pre-diabetic. Today, diabetics must *** their fingers to test blood glucose levels, a procedure that is invasive, painful, and subject to infrequent monitoring.

According to Otis, the smart contact lens represents a “new category of wearable devices that are comfortable, inexpensive, and empowering.” The lens does sensor data logging and uses a portable instrument to measure glucose levels. It is thin, cheap, and disposable, he said.

Moreover, the lens is not just for people already diagnosed with diabetes—it’s for anyone who is pre-diabetic, or may be at risk due to genetic predisposition. “If we are pro-active rather than re-active,” Otis said, “Instead of waiting until a person has full-fledged diabetes, we could make a huge difference in peoples’ lives and lower the costs of treating them.”

Technical Challenges

No one has built anything quite like the smart lens, so researchers at Google and Novartis are treading new ground. Otis identified three key challenges:

• Miniaturization: Everything must be really small—the SoC, the passive components, the power supply. Components must be flexible and cheap, and support thin-film integration.
• Platform: Google has developed a reusable platform that includes tiny, always-on wireless sensors, ultra low-power components, and standards-based interfaces.
• Data: Researchers are looking for the best ways to get the resulting data into a mobile device and onto the cloud.

Comfort is another concern. “This is not intended to be for the most severe cases,” Otis said. “This is intended to be for all of us as a pro-active way of improving our lifestyles.”

The platform provides a bidirectional encrypted wireless link, integrated power management, on-chip memory, standards-based RFID link, flexible sensor interface, high-resolution potentiostat sensor, and decoupling capacitors. Most of these capabilities are provided by the standard CMOS SoC, which is a couple hundred microns on a side and only “tens of microns” thick.

Otis noted that unpackaged ICs are typically 250 microns thick when they come back from the foundry. Thus, post-processing is needed so the IC will fit into a contact lens.

Furthermore, the design requires precision analog circuitry and additional environmental sensors. “Some of this stuff sounds mundane but it is really hard, especially when you find out you can’t throw large decoupling capacitors and bypass capacitors onto a board, and all that has to be re-integrated into the chip,” Otis said.

Sensor Challenges

Getting information from the human body is challenging. The smart lens sensor does a direct chemical measurement on the surface of the eye. The sensor is designed to work with very low glucose concentrations. This is because the concentration of glucose in tears is an order of magnitude lower than it is in blood.

In brief, the sensor has two parallel plates that are coated with an enzyme that converts glucose into hydrogen peroxide, which flows around the electrodes of the sensor. This is actually a fairly standard way of doing glucose monitoring. However, the smart lens sensor has two electrodes compared to the typical three.

In manufacturing, it is essential to keep costs low. Otis outlined a three-step manufacturing process:

• Start with the bottom layer, and mold a contact lens in the way you typically would.
• Add the electronics package on top of that layer.
• Build a second layer that encapsulates the electronics and provides the curvature needed for comfort and vision correction.

Beyond the technical challenges are the “clinical” challenges of working with human beings. The human body “is messy and very variable,” Otis said. This variability affects sensor performance and calibration, RF/electro-magnetic performance, system reliability, and comfort.

The final step is making use of the data. “We need to get the data from the device into a phone, and then display it so users can visualize the data,” Otis said. This provides “actionable feedback” to the person who needs it. Eventually, the data will need to be stored in the cloud.

As he concluded his talk, Otis noted that the platform his group developed may have many applications beyond glucose monitoring. “There is a lot you can do with a bunch of logic and sensing capability,” he said, “and there are hundreds of biomarkers beyond glucose.” Clearly this will be an interesting technology to watch.

Richard Goering

Related Blog Post

- Gary Smith at DAC 2015: How EDA Can Expand Into New Directions

As a leading venture capitalist in the electronics technology, as well as CEO of Cadence, Lip-Bu Tan has unique insights into ongoing changes that will impact EDA providers and users. Tan shared some of those insights in a “fireside chat” with Ed Sperling, editor in chief of Semiconductor Engineering, at the Design Automation Conference (DAC 2015) on June 9.

Topics of this discussion included industry consolidation, the need for more talent and more startups, Internet of Things (IoT) opportunities and challenges, the shift from ICs to full product development, and the challenges of advanced nodes. Following are some excerpts from this conversation, held at the DAC Pavilion theater on the exhibit floor.

Ed Sperling (left) and Lip-Bu Tan (right) discuss trends in semiconductors and EDA

Q: As you look out over the semiconductor and EDA industries these days, what worries you most?

Tan: At the top of my list is all the consolidation that is going on. Secondly, chip design complexity is increasing substantially. Time-to-market pressure is growing and advanced nodes have challenges.

The other thing I worry about is that we need to have more startups. There’s a lot of innovation that needs to happen. And this industry needs more top talent. At Cadence, we have a program to recruit over 10% of new hires every year from college graduates. We need new blood and new ideas.

Q: EDA vendors were acquiring companies for many years, but now the startups are pretty much gone. Where does the next wave of innovation come from?

Tan: I’ve been an EDA CEO for the last seven years and I really enjoy it because so much innovation is needed. System providers have very big challenges and very different needs. You have to find the opportunities and go out and provide the solutions.

The opportunities are not just in basic tools. Massive parallelism is critical, and the power challenge is huge. Time to market is critical, and for the IoT companies, cost is going to be critical. If you want to take on some good engineering challenges, this is the most exciting time.

Q: You live two lives—you’re a CEO but you’re also an investor. Where are the investments going these days and where are we likely to see new startups?

Tan: Clearly everybody is chasing the IoT. There is a lot of opportunity in the cloud, in the data center. Also, I’m a big believer in video, so I back companies that are video related. A big area is automotive. ADAS [Advanced Driver Assistance Systems] is a tremendous opportunity.

These companies can help us understand how the industry is transforming, and then we can provide solutions, either in terms of IP, tools, or the PCB. Then we need to connect from the system level down to semiconductors. I think it’s a different way to design.

Q: What happens as we start moving from companies looking to design a semiconductor to system companies who are doing things from the perspective that we have this purpose for our software?

Tan: We are extending from EDA to what we call system design enablement, and we are becoming more application driven. The application at the system level will drive the silicon design. We need to help companies look at the whole system including the power envelope and signal integrity. You don’t want to be in a position where you design a chip all the way to fabrication and then find the power is too high.

We help the customers with hardware/software co-design and co-verification. We have a design suite and a verification suite that can provide customers with high-level abstractions, as well as verify IP blocks at the system level. Then we can break things down to the component level with system constraints in mind, and drive power-aware, system-aware design.

We are starting to move into vertical markets. For example, medical is a tremendous opportunity.

Q: How does this approach change what you provide to customers?

Tan: Every year I spend time meeting with customers. I think it is very important to understand what they are trying to design, and it is also important to know the customer’s customer requirements. We might say, “Wait a minute, for this design you may want to think about power or the library you’re using.” We help them understand what foundry they should use and what process they should use. They don’t view me as a vendor—they view me as a partner.

We also work very closely with our IP and foundry partners. We work as one team—the ultimate goal is customer success.

Q: Is everybody going to say, FinFETs are beautiful, we’re going to go down to 10nm or 7nm—or is it a smaller number of companies who will continue down that path?

Tan: Some of the analog/mixed-signal companies don’t need to go that far. We love those customers—we have close to 50% of that business. But we also have customers in the graphics or processor area who are really pushing the envelope, and need to be in 16nm, 14nm, or 10nm. We work very closely with those guys to make sure they can go into FinFETs.

We always want to work with the customer to make sure they have a first-time silicon success. If you have to do a re-spin, you miss the opportunity and it’s very costly.

Q: There’s a new market that is starting to explode—IoT. How real is that world to you? Everyone talks about large numbers, but is it showing up in terms of tools?

Tan: Everybody is talking about huge profits, but a lot of the time I think it is just connecting old devices that you have. Billions of units, absolutely yes, but if you look close enough the silicon percentage of that revenue is very tiny. A lot of the profit is on the service side. So you really need to look at the service killer app you are trying to provide.

What’s most important to us in the IoT market is the IP business. That’s why we bought Tensilica—it’s programmable, so you can find the killer app more quickly. The other challenges are time to market, low power, and low cost.

Q: Where is system design enablement going? Does it expand outside the traditional market for EDA?

Tan: It’s not just about tools. IP is now 11% of our revenue. At the PCB level, we acquired a company called Sigrity, and through that we are able to drive system analysis for power, signal integrity, and thermal. And then we look at some of the verticals and provide modeling all the way from the system level to the component level. We make sure that we provide a solution to the end customer, rather than something piecemeal.

Q: What do you think DAC will look like in five years?

Tan: It’s getting smaller. We need to see more startups and innovative IP solutions. I saw a few here this year, and that’s good. We need to encourage small startups.

Q: Where do we get the people to pull this off? I don’t see too many people coming into EDA.

Tan: I talk to a lot of university students, and I tell them that this small industry is a gold mine. A lot of innovation is needed. We need them to come in [to EDA] rather than join Google or Facebook. Those are great companies, but there is a lot of fundamental physical innovation we need.

Richard Goering

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- Q&A with Nimish Modi: Going Beyond Traditional EDA

Design and verification standards are critical if we want to get a new generation of Internet of Things (IoT) devices into the market, according to panelists at an Accellera Systems Initiative breakfast at the Design Automation Conference (DAC 2015) June 9. However, IoT devices for different vertical markets pose very different challenges and requirements, making the standards picture extremely complicated.

The panel was titled “Design and Verification Standards in the Era of IoT.” It was moderated by industry editor John Blyler, CEO of JB Systems Media and Technology. Panelists were as follows, shown left to right in the photo below:

• Lu Dai, director of engineering, Qualcomm
• Wael William Diab, senior director for strategy marketing, industry development and standardization, Huawei
• Chris Rowen, CTO, IP Group, Cadence Design Systems, Inc.

In opening remarks, Blyler recalled a conversation from the recent IEEE International Microwave Symposium in which a panelist pointed to the networking and application layers as the key problem areas for RF and wireless standardization. Similarly, in the IoT space, we need to look “higher up” at the systems level and consider both software and hardware development, Blyler said.

Rowen helped set some context for the discussion by noting three important points about IoT:

• IoT is not a product segment. Vertical product segments such as automotive, medical devices, and home automation all have very different characteristics.
• IoT “devices” are components within a hierarchy of systems that includes sensors, applications, user interface, gateway application (such as cell phone), and finally the cloud, where all data is aggregated.
• A bifurcation is taking place in design. We are going from extreme scale SoCs to “extreme fit” SoCs that are specialized, low energy, and very low cost.

Here are some of the questions and answers that were addressed during the panel discussion.

Q: The claim was recently made that given the level of interaction between sensors and gateways, 50X more verification nodes would have to be checked for IoT. What standards need to be enhanced or changed to accomplish that?

Rowen: That’s a huge number of design dimensions, and the way you attack a problem of that scale is by modularization. You define areas that are protected and encapsulated by standards, and you prove that individual elements will be compliant with that interface. We will see that many interesting problems will be in the software layers.

Q: Why is standardization so important for IoT?

Dai: A company that is trying to make a lot of chips has to deal with a variety of standards. If you have to deal with hundreds of standards, it’s a big bottleneck for bringing your products to market. If you have good standardization within the development process of the IC, that helps time to market.

When I first joined Qualcomm a few years ago, there was no internal verification methodology. When we had a new hire, it took months to ramp up on our internal methodology to become effective. Then came UVM [Universal Verification Methodology], and as UVM became standard, we reduced our ramp-up time tremendously. We’ve seen good engineers ramp up within days.

Diab: When we start to look at standards, we have to do a better job of understanding how they’re all going to play with each other. I don’t think one set of standards can solve the IoT problem. Some standards can grow vertically in markets like industrial, and other standards are getting more horizontal. Security is very important and is probably one thing that goes horizontally.

Requirements for verticals may be different, but processing capability, latency, bandwidth, and messaging capability are common [horizontal] concerns. I think a lot of standards organizations this year will work on horizontal slices [of IoT].

Q: IoT interoperability is important. Any suggestions for getting that done and moving forward?

Rowen: The interoperability problem is that many of these [IoT] devices are wireless. Wireless is interesting because it is really hard – it’s not like a USB plug. Wireless lacks the infrastructure that exists today around wired standards. If we do things in a heavily wireless way, there will be major barriers to overcome.

Dai: There are different standards for 4G LTE technology for different [geographical] markets. We have to make a chip that can work for 20 or 30 wireless technologies, and the cost for that is tremendous. The U.S., Europe, and China all have different tweaks. A good standard that works across the globe would reduce the cost a lot.

Q: If we’re talking about the need to define requirements, a good example to look at is power. Certainly you have UPF [Unified Power Format] for the chip, board, and module.

Rowen: There is certainly a big role for standards about power management. But there is also a domain in which we’re woefully under-equipped, and that is the ability to accurately model the different power usage scenarios at the applications level. Too often power devolves into something that runs over thousands of cycles to confirm that you can switch between power management levels successfully. That’s important, but it tells you very little about how much power your system is going to dissipate.

Dai: There are products that claim to be UPF compliant, but my biggest problem with my most recent chip was still with UPF. These tools are not necessarily 100% UPF compliant.

One other concern I have is that I cannot get one simulator to pass my Verilog code and then go to another that will pass. Even though we have a lot of tools, there is no certification process for a language standard.

Q: When we create a standard, does there need to be a companion compliance test?

Rowen: I think compliance is important. Compliance is being able to prove that you followed what you said you would follow. It also plays into functional safety requirements, where you need to prove you adhered to the flow.

Dai: When we [Qualcomm] sell our 4G chips, we have to go through a lot of certifications. It’s often a differentiating factor.

Q: For IoT you need power management and verification that includes analog. Comments?

Rowen: Small, cheap sensor nodes tend to be very analog-rich, lower scale in terms of digital content, and have lots of software. Part of understanding what’s different about standardization is built on understanding what’s different about the design process, and what does it mean to have a software-rich and analog-rich world.

Dai: Analog is important in this era of IoT. Analog needs to come into the standards community.

Richard Goering

Cadence Blog Posts About DAC 2015

Gary Smith at DAC 2015: How EDA Can Expand Into New Directions

DAC 2015: Google Smart Contact Lens Project Stretches Limits of IC Design

DAC 2015: Lip-Bu Tan, Cadence CEO, Sees Profound Changes in Semiconductors and EDA

DAC 2015: “Level of Compute in Vision Processing Extraordinary” – Chris Rowen

DAC 2015: Can We Build a Virtual Silicon Valley?

DAC 2015: Cadence Vision-Design Presentation Wins Best Paper Honors

Let’s face it – the EDA industry needs new people and new ideas. One of the best places to find both is academia, and a presentation at the Cadence Theater at the recent Design Automation Conference (DAC 2015) described collaboration models that are working today.

The presentation was titled “Industry/Academia Engagement Models – From PhD Contests to R&D Collaborations.” It included these speakers, shown from left to right in the photo below:

• Prof. Xin Li, Electrical and Computer Engineering, Carnegie-Mellon University (CMU)
• Chuck Alpert, Senior Software Architect, Cadence
• Prof. Laleh Behjat, Department of Electrical and Computer Engineering, University of Calgary

Alpert, who was filling in for Zhuo Li, Software Architect at Cadence, was the vice chair of DAC 2015 and will be the general chair of DAC 2016 in Austin, Texas. “My team at Cadence really likes to collaborate with universities,” he said. “We’re a big proponent of education because we really need the best and brightest students in our industry.”

Contests Boost EDA Research

One way that Cadence collaborates with academia is participation in contests. “It’s a great way to formulate problems to academia,” Alpert said. “We can have the universities work on these problems and get some strategic direction.”

For example, Cadence has been involved with the annual CAD contest at the International Conference on Computer-Aided Design (ICCAD) since the contest was launched in 2012. This is the largest worldwide EDA R&D contest, and it is sponsored by the IEEE Council on EDA (CEDA) and the Taiwan Ministry of Education. Its goals are to boost EDA research in advanced real-world problems and to foster industry-academia collaboration.

Contestants can participate in one of more problems in the three areas of system design, logic synthesis and verification, and physical design. The 2015 contest has attracted 112 teams from 12 regions. Cadence contributes one problem per year in the logic synthesis area. Zhuo Li was the 2012 co-chair and the 2013 chair. The awards will be given at ICCAD in November 2015.

Another step that Cadence has taken, Alpert said, is to “hire lots of interns.” His own team has four interns at the moment. One advantage to interning at Cadence, he said, is that students get to see real-world designs and understand how the tools work. “It helps you drive your research in a more practical and useful direction,” he said.

The Cadence Academic Network co-sponsors the ACM SIGDA PhD Forum at DAC, and Xin Li and Zhuo Li are on the organizing committee. This event is a poster session for PhD students to present and discuss their dissertation research with people in the EDA community. This year’s forum was “packed,” Alpert said, and it’s clear that the event needs a bigger room.

Finally, Alpert noted, Cadence researchers write and publish technical papers at DAC and other conferences, and Cadence people serve on the DAC technical program committee. “We try to be involved with the academic community on a regular basis,” Alpert said. “We want the best and the brightest people to go into EDA because there is still so much innovation that’s needed. It’s a really cool place to be.”

Research Collaboration Exposes Failure Rates

Xin Li presented an example of a successful research collaboration between CMU and Cadence. The challenge was to find a better way to estimate potential failure rates in memory. As noted in a previous blog post, PhD student Shupeng Sun met this challenge with a new statistical methodology that won a Best Poster award at the ACM SIGDA PhD Forum at DAC 2014.

The new methodology is called Scaled-Sigma Sampling (SSS). It calculates the failure rate and accounts for variability in the manufacturing process while only requiring a few hundred, or a few thousand, sample circuit blocks. Previously, millions of samples were required for an accurate validation of a new design, and each sample could take minutes or hours to simulate. It could take a few weeks or months to run one validation.

The SSS methodology requires greatly reduced simulation times. It makes it possible, Li noted, to run simulations overnight and see the results in the morning.

Li shared his secret for success in collaborations. “I want to emphasize that before the collaboration, you have to understand the goal. If you don’t have a clear goal, don’t collaborate. Once you define the goal, stick to it and make it happen.”

Contest Provides Learning Experience

Last year Laleh Behjat handed two of her new PhD students a challenge. “I told them there is an ISPD [International Symposium for Physical Design] contest on placement, and I expect you to participate and I expect you to win. Not knowing anything about placement, I don’t think they realized what I was asking them.”

The 2015 contest was called the Blockage-Aware Detailed Routing-Driven Placement Contest. Results were announced at the end of March at ISPD. And the University of Calgary team, despite its lack of placement experience, took second place.

Such contests provide a good learning tool, according to Behjat. Graduate students in EDA, she said, “have to be good programmers. They have to work in teams and be collaborative, be able to innovate, and solve the hardest problems I have seen in engineering and science. And they have to think outside the box.” A contest can bring out all these attributes, she said.

Further, Behjat noted, contest participants had access to benchmarks and to a placement tool. They didn’t have to write tools to find out if their results were good. Industry sponsors, meanwhile, got access to good students and new approaches for solving problems.

“You can see Cadence putting a big amount of time, effort and money to get students here and get them excited about doing contests,” she said. She advised students in the theater audience to “talk to people in the Cadence booth and see if you can have more ideas for collaboration.”

Richard Goering

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EDA investor and former executive Jim Hogan is optimistic about automotive electronics, but he has some concerns as well. At the recent Design Automation Conference (DAC 2015), he delivered a speech titled “The Looming Quality, Reliability, and Safety Crisis in Automotive Electronics...Why is it and what can we do to avoid it?"

Hogan gave the keynote speech for IP Talks!, a series of over 30 half-hour presentations located at the ChipEstimate.com booth. Presenters included ARM, Cadence, eSilicon, Kilopass, Sidense, SilabTech, Sonics, Synopsys, True Circuits, and TSMC. Held in an informal setting, the talks addressed the challenges faced by SoC design teams and showed how the latest developments in semiconductor IP can contribute to design success.

Jim Hogan delivers keynote speech at DAC 2015 IP Talks!

Hogan talked about several phases of automotive electronics. These include assisted driving to avoid collisions, controlled automation of isolated tasks such as parallel parking, and, finally, fully autonomous vehicles, which Hogan expects to see in 15 to 20 years. The top immediate priorities for automotive electronics designers, he said, will be government regulation, fuel economy, advanced safety, and infotainment.

More Code than a Boeing 777

According to Hogan, today’s automobiles use 50-100 microcontrollers per car, resulting in a worldwide automotive semiconductor market of around $40 billion. The global market for advanced automotive electronics is expected to reach $240 billion by 2020. Software is growing faster in the automotive market than it is in smartphones. Hogan quoted a Ford vice president who observed that there are more lines of code in a Ford Fusion car than a Boeing 777 airplane.

One unique challenge for automotive electronics designers is long-term reliability. This is because a typical U.S. car stays on the road for 15 years, Hogan said. Americans are holding onto new vehicles for a record 71.4 months.

Another challenge is regulatory compliance. Aeronautics is highly regulated from manufacturing to air traffic control, and the same will probably be true of automated cars. Hogan speculated that the Department of Transportation will be the regulatory authority for autonomous cars. Today, automotive electronics providers must comply with the ISO26262 automotive functional safety specification.

So where do we go from here? “We’ve got to change our mindset,” Hogan said. “We’ve got to focus on safety and reliability and demand a different kind of engineering discipline.” You can watch Hogan’s entire presentation by clicking on the video icon below, or clicking here. You can also watch other IP Talks! videos from DAC 2015 here.

https://youtu.be/qL4kAEu-PNw

Richard Goering

Related Blog Posts

DAC 2015: See the Latest in Semiconductor IP at “IP Talks!”

Automotive Functional Safety Drives New Chapter in IC Verification

In 1985, as a relatively new editor at Computer Design magazine, I was asked to go forth and cover a new business called CAE (computer-aided engineering). I knew nothing about it, but I had been writing about design for test, so there seemed to be somewhat of a connection. Little did I know that “CAE” would turn into “EDA” and that I’d write about it for the next 30 years, for Computer Design, EE Times, Cadence, and a few others.

Now that I’m about to retire, I’m looking back over those 30 years. What a ride it has been! By the numbers I covered 31 Design Automation Conferences (DACs), hundreds of new products, dozens of acquisitions and startups, dozens of lawsuits, and some blind alleys that didn’t work out (like “silicon compilation”). Chip design went from gate arrays and PLDs with a few thousand gates to processors and SoCs with billions of transistors.

In 1985 there were three big CAE vendors – Daisy Systems, Mentor Graphics, and Valid Logic. All sold bundled packages that included workstations and CAE software; in fact, Daisy and Valid designed and manufactured their own workstations. In the early 1980s a workstation with schematic capture and gate-level logic simulation might have set you back $120,000. In 1985 OrCAD, now part of Cadence, came out with a $500 schematic capture package running on IBM PCs.

Cadence and Synopsys emerged in the late 1980s, and by the 1990s the EDA industry was pretty much a software-only business (apart from specialized machines like simulation accelerators). Since the early 1990s the “big three” EDA vendors have been Cadence, Synopsys, and Mentor, giving the industry stability but allowing for competition and innovation.

Here, in my view, are some of the highlights that occurred during the past 30 years of EDA.

EDA is a Highlight

The biggest highlight in EDA is the existence of a commercial EDA industry! Marching hand in hand with the fabless semiconductor revolution, commercial EDA made it possible for hundreds of companies to design semiconductors, as opposed to a small handful that could afford large internal CAD operations and fabs. With hundreds of semiconductor companies as opposed to a half-dozen, there’s a lot more creativity, and you get the level of sophistication and intelligence that you see in your smartphone, video camera, tablet, gaming console, and car today.

CAE + CAD = EDA. This is not just a terminology issue. By the mid-1980s it became clear that front-end design (CAE) and physical design (CAD) belonged together. The big CAE vendors got involved in IC and PCB CAD, and presented increasingly integrated solutions. People got tired of writing “CAE/CAD” and “EDA” was born.

The move from gate-level design to RTL. This move happened around 1990, and in my view this is EDA’s primary technology success story during the past 30 years. Moving up in abstraction made the design and verification of much larger chips possible. Going from gate-level schematics to a hardware description language (HDL) revolutionized logic design and verification. Which would you rather do – draw all the gates that form an adder, or write a few lines of code and let a synthesis tool find an adder in your chosen technology?

Two developments made this shift in design possible. One was the emergence of commercial RTL synthesis (or “logic synthesis”) tools from Synopsys and other companies, which happened around 1990. Another was the availability of Verilog, developed by Gateway Design Automation and purchased by Cadence in 1989, as a standard RTL HDL. Although most EDA vendors at the time were pushing VHDL, designers wanted Verilog and that’s what most still use (with SystemVerilog coming on strong in the verification space).

IC functional verification underwent huge changes in the late 1990s and early 2000s, largely due to new technology developed by Verisity, which was acquired by Cadence in 2005. Before Verisity, verification engineers were writing and running directed tests in an ad-hoc manner. Verisity introduced or improved technologies such as pseudo-random test generation, coverage metrics, reusable verification IP, and semi-automated verification planning. The Verisity “e” language became a widely used hardware verification language (HVL).

The biggest way that EDA has expanded its focus has been through semiconductor IP. Today Synopsys and Cadence are leading providers in this area. Thanks to the availability of design and verification IP, many SoC designs today reuse as much as 80% of previous content. This makes it much, much faster to design the remaining portion. While IP began with fairly simple elements, today commercially available IP can include whole subsystems along with the software that runs on them. With IP, EDA vendors are providing not only design tools but design content.

Finally, the EDA industry has done an amazing job of keeping up with SoC complexity and with advanced process nodes. Thanks to intense and early collaboration between foundries, IP, and EDA providers, tools and IP have been ready for process nodes going down to 10nm.

Where Does ESL Fit?

In some ways, electronic system level (ESL) design is both a lowlight and a highlight. It’s a lowlight because people have been talking about it for 30 years and the acceptance and adoption have come very slowly. ESL is a highlight because it’s finally starting to happen, and its impact on design and verification flows could be dramatic. Still, ESL is vaguely defined and can be used to describe almost anything that happens at a higher abstraction level than RTL.

High-level synthesis (HLS) is an ESL technology that is seeing increasing use in production environments. Current HLS tools are not restricted to datapaths, and they produce RTL code that gives better quality of results than hand-written RTL. Another ESL methodology that’s catching on is virtual prototyping, which lets software developers write software pre-silicon using SystemC models. Both HLS and virtual prototyping are made possible by the standardization of SystemC and transaction-level modeling (TLM). However, it’s still not easy to use the same SystemC code for HLS and virtual prototyping.

And Now, Some Lowlights

Every new industry has some twists and turns, and EDA is no exception. For example, the EDA industry in the 1980s and 1990s sparked a lot of lawsuits. At EE Times my colleagues and I wrote a number of articles about EDA legal disputes, mostly about intellectual property, trade secrets, or patent issues. Over the past decade, fortunately, there have been far fewer EDA lawsuits than we had before the turn of the century.

Another issue that was troublesome in the 1980s and 1990s was so-called “standards wars.” These would occur as EDA vendors picked one side or the other in a standards dispute. For example, power intent formats were a point of conflict in the early 2000s, but the Common Power Format (CPF) and the Unified Power Format (UPF) are on the road to convergence today with the IEEE 1801 effort. As mentioned previously, Verilog and VHDL were competing for adoption in the early 1990s. For the most part, Verilog won, showing that the designer community makes the final decision about which standards will be used.

How on earth did there get to be something like 30 DFM (design for manufacturability) companies 10-12 years ago? To my knowledge, none of these companies are around today. A few were acquired, but most simply faded away. A lot of investors lost money. Today, VCs and angel investors are funding very few EDA or IP startups. There are fewer EDA startups than there used to be, and that’s too bad, because that’s where a lot of the innovation comes from.

Here’s another current lowlight -- not enough bright engineering or computer science students are joining EDA companies. They’re going to Google, Apple, Facebook, and the like. EDA is perceived as a mature industry that is still technically very difficult. We need to bring some excitement back into EDA.

Where Is EDA Headed?

Now we come to what you might call “headlights” and look at what’s coming. My list includes:

• System Design Enablement. This term has been coined by Cadence to describe a focus on whole systems or end products including chips, packages, boards, embedded software, and mechanical components. There are far more systems companies than semiconductor companies, leaving a large untapped market that’s looking for solutions.
• New frontiers for EDA. At a 2015 Design Automation Conference speech, analyst Gary Smith suggested that EDA can move into markets such as embedded software, mechanical CAD, biomedical, optics, and more.
• Vertical markets. EDA has until now been “horizontal,” providing the same solution for all market segments. Going forward, markets like consumer, automotive, and industrial will have differing needs and will need optimized tools and IP.
• Internet of Things. This is a current buzzword, but the impact on EDA remains uncertain. Many IoT devices will be heavily analog, use mature process nodes, and be dirt cheap. Lip-Bu Tan, Cadence CEO, recently pointed out that the silicon percentage of IoT revenue will be small and that a lot of the profits will be on the service side.

Moving On

For the past six years I’ve been writing the Industry Insights blog at Cadence.com. All things change, and with this post comes a farewell – I am retiring in late June and will be pursuing a variety of interests other than EDA. I’ll be watching, though, to see what happens next in this small but vital industry. Thanks for reading!

Richard Goering

Hello, i have a logic output from a D-flipflop which generates a reset signal with variable pulse width. I want to stretch this LOW pulse width with an extra 100ns added to the original pulse width digitally, is there any way to do that?

Hi,

Is it possible to use a SystemVerilog package which is compiled into a library and then use it in a VHDL-2008 design file? Is such mixed-language flow supported?

I'm considering the latest versions of Incisive / Xcelium available today (Oct 2019).

Thank you,

Michal

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HI All,

I am new to skill. My requirement is

open layout 

get m0 layer cordinates in a layout

dump info into a text file

For example 2 input Nand, A,B output , vcc , vssx and internal net (n2) will be the m0 layers. I need info like in a text file.

n2 co ordinate

vssx (co ordinate)

a (co ordinate)

b (co ordinate ) .

I found similar code in cadence form . Can you help me on this

 procedure(printPts()
let(    (type
    (cnt 0)
    (objList geGetSelSet()))

foreach(obj objList
    ++cnt
    type = obj~>objType
    case(type
        ("inst"
            printf("%s %L at %L " type obj~>xy))
        ("rect"
            printf("%s on layer %L at %L " type obj~>lpp obj~>bBox))
        ("polygon"
            printf("%s on layer %L at %L " type obj~>lpp obj~>points))
        ("path"
            printf("%s on layer %L at %L " type obj~>lpp obj~>points))
        ("pathSeg"
            printf("%s on layer %L at %L " type obj~>lpp list(obj~>beginPt obj~>endPt)))
        ("label"
            printf("%s on layer %L at %L " type obj~>lpp obj~>xy))
        (t    printf("%s not defined " type))
    )
)
printf("%n objects selected " cnt)
); end of let
); end of printPts

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Vegas, here we come. All of us fun EDA engineers at once. Be prepared, next week’s Design Automation Conference will be busy! The trends I had outlined after last DAC in 2018—system design, cloud, and machine learning—have...(read more)

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On May 7, 2013 Cadence announced a 30% productivity gain in the June 2013 Incisive Enterprise Simulator 13.1 release.  Advanced debug visualization, faster turn-around time, and the extension of eight years of low-power verification innovation to IEEE 1801/UPF are the key capabilities in the release.

When we talk about low-power verification its easy to equate it with simulation.  For certain, simulation is the heart of a low-power verification solution. Simulation enables engineers to run their design in the context of power intent.  The challenge is that a simulation-only approach is inadequate. For example, if engineers could achieve SoC quality by verifying the individual function of each power control module (PCM), then simulation could be enough.  For a single power domain, simulation can be enough. 

However, when the SoC has multiple power domains -- and we have seen SoCs with hundreds of them -- engineers have to check the PCMs and all of the arcs between the power modes.  These SoCs often synchronize some of the domain switching to reduce overall complexity, creating the potential for signal skew errors on the control signals for the connected domains.  Managing these complexities requires verification methodologies including advanced debug, verification planning, assertion-based verification, Universal Verification Methodology - Low Power (UVM-LP), and more (see Figure 1).

Figure 1:  Comprehensive Low-Power Verification 

But even advanced verification methodologies on top of simulation aren't enough.  For example, the state machine that defines the legal and illegal power mode transitions is often written in software. The speed and capacity of the Palladium emulation platform is ideal to verify in this context, and it is integrated with simulation sharing debug, UVM acceleration, and static checks for low-power. And, it reports verification progress into a holistic plan for the SoC.  Another example is the ability to compare the design in the implementation flow with the design running in simulation to make sure that what we verify is what we intend to build.

Taken together, verification across multiple engines provides the comprehensive low-power verification needed for today's advanced node SoCs.  That's the heart of this low-power verification announcement. 

Another point you may have noticed is the extension of the Common Power Format (CPF) based power-aware support in the Incisive Enterprise Simulator to IEEE 1801.  We chose to bring IEEE 1801 to simulation first because users like you sometimes need to mix vendors for regression flows.  Over time, Cadence will extend the low-power capabilities throughout its product suite to IEEE 1801.

If you are using CPF today, you already have the best low-power solution. The evidence is clear:  the upcoming IEEE 1801-2013 update includes many of the CPF features contributed to 1801/UPF to enable methodology convergence.  Since you already have those features in the CPF flow, any migration before you have a mature IEEE 1801-2013 tool flow would reduce the functionality you have today.

If you are using Unified Power Format (UPF) 1.0 today, you want to start planning your move toward the IEEE 1801-2013 standard.  A good first step would be to move to the IEEE 1801-2009 standard.  It fills holes in the earlier UPF 1.0 definition.  While it does lack key features in -2013, it is an improvement that will make the migration to -2013 easier. The Incisive 13.1 release will run both UPF 1.0 and IEEE 1801-2009 power intent today.

Over the next few weeks you'll see more technical blogs about the low-power capabilities coming in the Incisive 13.1 release.  You can also join us on June 19 for a webinar that will introduce those capabilities using the reference design supplied with the Incisive Enterprise Simulator release.

=Adam "The Jouler" Sherer

(Yes, "Sherilog" is still here.  :-) )

The IEEE has announced the publication of the new 1801-2013 standard, also known as UPF 2.1, and immediate availability for free download through the IEEE 1801-2013 Get Program. Even though the standard is new to the whole world, for the people of the IEEE working group this standard is finally done and is in the past now.

There is a Chinese saying "好事多磨" which means "good things take time to happen." I forgot the exact time when I first joined the working group for the new standard -- about two and half years ago -- but I do remember long hours of meetings and many "lively" debates and discussions. Since the "hard time" has passed us, I would like to share some fun facts about the working group and the standard.

• The 1801 working group is the largest entity based ballot group in IEEE-SA history.
• The new standard was initially planned for 2012, but was delayed purely due to the large amount of work required.
• At one point, the group was debating on whether the new standard should be called UPF 2.1 or 3.0. It may sound weird now but we spent quite some time discussing this. Eventually we settled on 2.1 as it was the original plan.
• The 1801-2013 document has 358 pages which is 53% thicker than previous version (the sheer amount of changes in the new standard indicate that this is more than just a normal incremental update of the previous version as suggested by naming it 2.1)
• Around 300 real issues were reported over the previous version and a majority of them were fixed in the new release.
• This is the first release with constructs and semantics coming from Common Power Format (CPF), a sign of convergence of the two industry leading power formats.
• There are about 100 working group meetings in my Outlook calendar since 2011, with meeting times ranging from 2 hours to 8 hours.
• We extensively used Google Drive (which was called Google Docs when the working group started), a great tool for productivity. I cannot imagine how any standard could have been done before Google existed!

Personally, I had an enjoyable journey, especially from having the privilege to work with many industry experts who are all passionate about low power. I do have one more thing to share though. My older daughter went from middle school to high school during the period of the development of the new standard. Since most of the meetings took place in the early morning California time, she had to endure the pain of listening to all these discussions on power domain, power switches, etc. on her way to school.

I asked her if she learned anything. She told me that other than being able to recognize the voices of Erich, John and Joe on the line, she also learned that she would never want to become an electrical or computer engineer! She was so happy that the meetings stopped a couple of months ago. But what I did not tell her is that the meetings will resume after DAC! Well, I am sure this will be a big motivation for her to get her own driving license in the summer.

If you want to get some quick technical insights into the new standard, check out my recent EE Times article IEEE 1801-2013: A bold step towards power format convergence.

Qi Wang

There is no better way other than a self-help training kit -- (rapid adoption kit, or RAK) -- to demonstrate the Incisive Enterprise Simulator's IEEE 1801 / UPF low-power features and its usage. The features include:

• Unique SimVision debugging 
• Patent-pending power supply network visualization and debugging
• Tcl extensions for LP debugging
• Support for Liberty file power description
• Standby mode support
• Support for Verilog, VHDL, and mixed language
• Automatic understanding of complex feedthroughs
• Replay of initial blocks
• ‘x' corruption for integers and enumerated types
• Automatic understanding of loop variables
• Automatic support for analog interconnections

Mickey Rodriguez, AVS Staff Solutions Engineer has developed a low power UPF-based RAK, which is now available on Cadence Online Support for you to download.

• This rapid adoption kit illustrates Incisive Enterprise Simulator (IES) support for the IEEE 1801 power intent standard. 

Patent-Pending Power Supply Network Browser. (Only available with the LP option to IES)

• In addition to an overview of IES features, SimVision and Tcl debug features, a lab is provided to give the user an opportunity to try these out.

The complete RAK and associated overview presentation can be downloaded from our SoC and Functional Verification RAK page:

We are covering the following technologies through our RAKs at this moment:

Synthesis, Test and Verification flow
Encounter Digital Implementation (EDI) System and Sign-off Flow
Virtuoso Custom IC and Sign-off Flow
Silicon-Package-Board Design
Verification IP
SOC and IP level Functional Verification
System level verification and validation with Palladium XP

Please visit https://support.cadence.com/raks to download your copy of RAK.

We will continue to provide self-help content on Cadence Online Support, your 24/7 partner for learning more about Cadence tools, technologies, and methodologies as well as getting help in resolving issues related to Cadence software. If you are signed up for e-mail notifications, you're likely to notice new solutions, application notes (technical papers), videos, manuals, etc.

Note: To access the above documents, click a link and use your Cadence credentials to log on to the Cadence Online Support https://support.cadence.com/ website.

Happy Learning!

Sumeet Aggarwal and Adam Sherer

If you weren't able to attend the 2013 DVCon, you missed out on a great IEEE 1801/UPF tutorial delivered by members of the IEEE committee. Accellera had the event recorded and that recording is now posted on the Accellera.org website. Regardless of your work so far with low power design and verification, you need to watch this video.

Power management is becoming ubiquitous in our world. The popular aspect is that reduced power is good for the evironment and that is true. But for those teams that have been building chips around the 40nm node and below, there is another truth. Power management is required simply to get working silicon in many cases. As the industry expands the number of designs with power management and forges deeper into advanced nodes, we steadily identify improvements to the power format descriptions. The most recent set of imporvements to the IEEE 1801 standard are now available in the 2013 version of that standard.

To help bring the standard to life, five representatives from the IEEE joined to deliver a tutorial at DVCon in 2013. Qi Wang (Cadence), Erich Marschner (Mentor), Jeffrey Lee (Synopsys), John Biggs (ARM), and Sushma Honnavarra-Prasad (Broadcom) each contributed to the tutorial. It started with a review of the UPF basics that led to the IEEE 1801 standard delivered by the EDA companies. The IEEE 1801 users then presented tutorial content on how to apply the standard. The session then concluded with a look forward to the IEEE 1801-2013 (UPF 2.1) standard. The standard was released two months after the DVCon tutorial and is available through the Accellera Get program.

So after the bowl games are over and you'vre returned through the woods and back over the river from Grandma's, grab a cup of hot cocoa and learn more about the power standards you may well be using in 2014.

Regards,

Adam "The Jouler" Sherer

ST Microelectronics reported their success with IEEE 1801 / UPF low-power simulation using Incisive Enterprise Simulator at CDNLive India in November 2013. We were able to meet with Mohit Jain just after his presentation and recorded this video that explains the key points in his paper.

With eight years of experience and pioneering technology in native low-power simulation, Mohit was able to apply Incisive Enterprise Simulator to a low-power demonstrator in preparation for use with a production set-top box chip.  Mohit was impressed with the ease in which he was able to reuse his existing IEEE 1801 / UPF code successfully, including the power format files and the macro models coded in his Liberty files. Mohit also discusses how he used the power-aware Cadence SimVision debugger.

The Cadence low-power verification solution for IEEE 1801 / UPF also incorporates the patent-pending Power Supply Network visualization in the SimVision debugger.  You can learn more about that in the Incisive low-power verification Rapid Adoption Kit for IEEE 1801 / UPF here in Cadence Online Support.

Just another happy Cadence low-power verification user!

Regards,

 Adam "The Jouler" Sherer 

Hello,

Would anyone know how to setup a PSS or QPSS simulation with 25% dutycycle clock sources or if such a thing is possible with QPSS.

Fig1 (below) is a snapshot of the circuit I am trying to characterize. This has 4 clock ports each with 25%duty cycle in the ON state. Fig2 below shows two of these clocks.

Each path in the circuit consists of two switches with a low pass RC sandwiched in between. The Input is a 50Ohm port sine wave and the output is a 1K resistor. The output nets of all paths are connected together.

I am trying to determine the swept frequency response from input to output (voltage) when the input is from 500Mhz to  510MHz. The Period (T=1/Fp) of each of the pulses is such that Fp=500MHz. The first pulse source has a delay=0, second has delay=T/4, third delay=2T/4, etc...

I am currently getting it working and seeing the correct result (bandpass response) with Transient but the problem is doing a dft at 500MHz with 10KHz spacings needs at least 100us and takes up a lot of time and disk space.

Many Thanks,
Chris.

Fig1

Fig2

Hi, I'm trying to create a circle from a pin with 10 mil air gap and at 45 degree rotation. The problem that im facing is that, I'm unable to get the bBox upper left coordinates. Because I want my circle to be placed from that coordinate with a 10 mil air gap. And the pins are "regular" and are placed on "Etch/Top" Layer. Kindly help me in solving this issue.

Hi,

I am facing this elaboration error when using Xcelium:

Command>

    xmverilog -v200x +access+r +xm64bit -f vlist -reflib plib -timescale 1ns/1ps

Log>

    xmelab: *E,CUVMUR (<name>.v,538|18): instance 'LUTP0.C GLAT3' of design unit 'tlatntscad12' is unresolved in 'worklib.LUTP0:v'.

I guess the plib was not referred to as the simulation configuration because the tlatntscad12 is included in plib.

The plib is compiled by INCISIVE 13.20 and I am using the Xcelium 19.30.

Please tell me the correct command on how to refer to the library directory compiled by different versions.

Thank you,

Sample clues

5 down: Torso covering (6)

7 down: Government by rogues (12)

15 across: eBay speciality (7)

18 across: Demonic (8)

20 across: Common language (6,6)

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Sample clues

17 across: Beckham speciality (4,4)

4 down: Havana speciality (5)

19 across: Infamous 1988 commercial against Michael Dukakis (9,4)

11 down: Precisely (2,3,3)

13 down: City infamously ransacked by the Japanese in 1937 (7)

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Sample clues

11 across: Chandigarh’s is 0172 (3,4)

21 across: He’s a loser, baby (4)

1 down: Garment meant to shape the torso (6)

12 down: It’s slogan: “Life, Liberty and the Pursuit” (8)

18 down: Noise made by badminton players? (6)

Extrowords © 2007 IndiaUncut.com. All rights reserved.
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Sample clues

5 across: The US president’s bird (3,5,3)

11 down: Group once known as the Quarrymen (7)

10 across: Cavalry sword (5)

19 across: Masonic ritual (5,6)

1 down: Pioneer of Ostpolitik (6)

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Sample clues

14 across: FDR’s baby (3,4)

1 down: A glitch in the Matrix? (4,2)

4 down: Slanted character (6)

5 down: New Year’s venue in New York (5,6)

16 down: Atmosphere of melancholy (5)

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Sample clues

6 across: Alejandro González Iñárritu’s breakthrough film (6,6)

19 across: Soft leather shoe (8)

7 down: Randroids, for example (12)

12 down: First American World Chess Champion (7)

17 down: Circle of influence (5)

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Sample clues

5 across: Robbie Robertson song about Richard Manuel (6,5)

2 down: F5 on a keyboard (7)

10 across: Lionel Richie hit (5)

3 down: ALTAIR, for example (5)

16 down: The problem with Florida 2000 (5)

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Sample clues

9 across: Van Morrison classic from Moondance (7)

6 down: Order beginning with ‘A’ (12)

6 across: Fatal weakness (8,4)

19 across: Rolling Stones classic (12)

4 down: Massacre tool (8)

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I'm trying to re-install ORCAD 17.2  in a PC from a DVD which I have upgraded from Win 7 to Win 10 and  now has a new 500GB SSD. While installing I got a Windows Application Error  0xc000007b. When I try to run ORCAD I get the same Error.

Looking for ways to fix this problem.

I would like to add these components to the component bank in ORCAD simulation. Even an accessible or free course that explained how to create these components.

Hi

I have this error when I run the simulation 

SPECTRE_DEFAULTS=-I/CMC/kits/tsmc_130nm/CR013G/PDK_OA/PDKOA33/models/spectre -f psfbin
Command line:
/CMC/tools/cadence/MMSIM15.10.801_lnx86/tools.lnx86/bin/spectre -64
input.scs +escchars +log ../psf/spectre.out +inter=mpsc
+mpssession=spectre0_28131_1 -format psfxl -raw ../psf
-I/CMC/kits/cmosp13.V1.8.0.0DM/IBM_PDK/cmrf8sf/V1.8.0.4DM/Spectre/models
-I/CMC/kits/tsmc_130nm/CR013G/PDK_OA/PDKOA33/models/spectre
+lqtimeout 900 -maxw 5 -maxn 5

ERROR (SPECTRE-308): Unable to open input directory '/CMC/kits/tsmc_130nm/CR013G/PDK_OA/PDKOA33/models/spectre'.
Permission denied or no such directory. ERROR (SPECTRE-308): Unable to open input directory '/CMC/kits/tsmc_130nm/CR013G/PDK_OA/PDKOA33/models/spectre'.
Permission denied or no such directory.spectre pid = 29312

Loading /CMC/tools/cadence/MMSIM15.10.801_lnx86/tools.lnx86/cmi/lib/64bit/5.0/libinfineon_sh.so ...
Loading /CMC/tools/cadence/MMSIM15.10.801_lnx86/tools.lnx86/cmi/lib/64bit/5.0/libphilips_o_sh.so ...

Could someone suggest any solution.

Thank you in advance,

Sali

Dear All,
When I want to start simulation with spectre the error says:
Fatal error: Illegal library definition found in netlist
I set the model file correctly, but I don't know why it errors!
I opened the ADE>>Setup>>Model library
and I tried to modify the path of models file (SCS files)
It gives me "Illegal library definition found in netlist"
Thanks.

Key Findings: Many more design teams will be reaching the mixed-signal methodology tipping point in 2015. That means you need to have a (verification) plan, and measure and execute against it.

As 2014 draws to a close, it is time to look ahead to the coming years and make a plan. While the macro view of the chip design world shows that is has been a mixed-signal world for a long time, it is has been primarily the digital teams that have rapidly evolved design and verification practices over the past decade. Well, I claim that is about to change. 2015 will be a watershed year for many more design teams because of the following factors:

• 85% of designs are mixed signal, and it is going to stay that way (there is no turning back)
• Advanced node drives new techniques, but they will be applied on all nodes
• Equilibrium of mixed-signal designs being challenged, complexity raises risk level
• Tipping point signs are evident and pervasive, things are going to change
• The convergence of “big A” and “big D” demands true mixed-signal practices

Reason 1: Mixed-signal is dominant

To begin the examination of what is going to change and why, let’s start with what is not changing. IBS reports that mixed signal accounts for over 85% of chip design starts in 2014, and that percentage will rise, and hold steady at 85% in the coming years. It is a mixed-signal world and there is no turning back!

Figure 1. IBS: Mixed-signal design starts as percent of total

The foundational nature of mixed-signal designs in the semiconductor industry is well established. The reason it is exciting is that a stable foundation provides a platform for driving change. (It’s hard to drive on crumbling infrastructure.  If you’re from California, you know what I mean, between the potholes on the highways and the earthquakes and everything.)

Reason 2: Innovation in many directions, mostly mixed-signal applications

While the challenges being felt at the advanced nodes, such as double patterning and adoption of FinFET devices, have slowed some from following onto to nodes past 28nm, innovation has just turned in different directions. Applications for Internet of Things, automotive, and medical all have strong mixed-signal elements in their semiconductor content value proposition. What is critical to recognize is that many of the design techniques that were initially driven by advanced-node programs have merit across the spectrum of active semiconductor process technologies. For example, digitally controlled, calibrated, and compensated analog IP, along with power-reducing mutli-supply domains, power shut-off, and state retention are being applied in many programs on “legacy” nodes.

Another graph from IBS shows that the design starts at 45nm and below will continue to grow at a healthy pace.  The data also shows that nodes from 65nm and larger will continue to comprise a strong majority of the overall starts. 

Figure 2.  IBS: Design starts per process node

TSMC made a comprehensive announcement in September related to “wearables” and the Internet of Things. From their press release:

TSMC’s ultra-low power process lineup expands from the existing 0.18-micron extremely low leakage (0.18eLL) and 90-nanometer ultra low leakage (90uLL) nodes, and 16-nanometer FinFET technology, to new offerings of 55-nanometer ultra-low power (55ULP), 40ULP and 28ULP, which support processing speeds of up to 1.2GHz. The wide spectrum of ultra-low power processes from 0.18-micron to 16-nanometer FinFET is ideally suited for a variety of smart and power-efficient applications in the IoT and wearable device markets. Radio frequency and embedded Flash memory capabilities are also available in 0.18um to 40nm ultra-low power technologies, enabling system level integration for smaller form factors as well as facilitating wireless connections among IoT products.

Compared with their previous low-power generations, TSMC’s ultra-low power processes can further reduce operating voltages by 20% to 30% to lower both active power and standby power consumption and enable significant increases in battery life—by 2X to 10X—when much smaller batteries are demanded in IoT/wearable applications.

The focus on power is quite evident and this means that all of the power management and reduction techniques used in advanced node designs will be coming to legacy nodes soon.

Integration and miniaturization are being pursued from the system-level in, as well as from the process side. Techniques for power reduction and system energy efficiency are central to innovations under way.  For mixed-signal program teams, this means there is an added dimension of complexity in the verification task. If this dimension is not methodologically addressed, the level of risk adds a new dimension as well.

Reason 3: Trends are pushing the limits of established design practices

Risk is the bane of every engineer, but without risk there is no progress. And, sometimes the amount of risk is not something that can be controlled. Figure 3 shows some of the forces at work that cause design teams to undertake more risk than they would ideally like. With price and form factor as primary value elements in many growing markets, integration of analog front-end (AFE) with digital processing is becoming commonplace.  

Figure 3.  Trends pushing mixed-signal out of equilibrium

The move to the sweet spot of manufacturing at 28nm enables more integration, while providing excellent power and performance parameters with the best cost per transistor. Variation becomes great and harder to control. For analog design, this means more digital assistance for calibration and compensation. For greatest flexibility and resiliency, many will opt for embedding a microcontroller to perform the analog control functions in software. Finally, the first wave of leaders have already crossed the methodology bridge into true mixed-signal design and verification; those who do not follow are destined to fall farther behind.

Reason 4: The tipping point accelerants are catching fire

The factors cited in Reason 3 all have a technical grounding that serves to create pain in the chip-development process. The more factors that are present, the harder it is to ignore the pain and get the treatment relief  afforded by adopting known best practices for truly mixed-signal design (versus divide and conquer along analog and digital lines design).

In the past design performance was measured in MHz with simple static timing and power analysis. Design flows were conveniently partitioned, literally and figuratively, along analog and digital boundaries. Today, however, there are gigahertz digital signals that interact at the package and board level in analog-like ways. New, dynamic power analysis methods enabled by advanced library characterization must be melded into new design flows. These flows comprehend the growing amount of feedback between analog and digital functions that are becoming so interlocked as to be inseparable. This interlock necessitates design flows that include metrics-driven and software-driven testbenches, cross fabric analysis, electrically aware design, and database interoperability across analog and digital design environments.

Figure 4.  Tipping point indicators

Energy efficiency is a universal driver at this point.  Be it cost of ownership in the data center or battery life in a cell phone or wearable device, using less power creates more value in end products. However, layering multiple energy management and optimization techniques on top of complex mixed-signal designs adds yet more complexity demanding adoption of “modern” mixed-signal design practices.

Reason 5: Convergence of analog and digital design

Divide and conquer is always a powerful tool for complexity management.  However, as the number of interactions across the divide increase, the sub-optimality of those frontiers becomes more evident. Convergence is the name of the game.  Just as analog and digital elements of chips are converging, so will the industry practices associated with dealing with the converged world.

Figure 5. Convergence drivers

Truly mixed-signal design is a discipline that unites the analog and digital domains. That means that there is a common/shared data set (versus forcing a single cockpit or user model on everyone). 

In verification the modern saying is “start with the end in mind”. That means creating a formal approach to the plan of what will be test, how it will be tested, and metrics for success of the tests. Organizing the mechanics of testbench development using the Unified Verification Methodology (UVM) has proven benefits. The mixed-signal elements of SoC verification are not exempted from those benefits.

Competition is growing more fierce in the world for semiconductor design teams. Not being equipped with the best-known practices creates a competitive deficit that is hard to overcome with just hard work. As the landscape of IC content drives to a more energy-efficient mixed-signal nature, the mounting risk posed by old methodologies may cause causalities in the coming year. Better to move forward with haste and create a position of strength from which differentiation and excellence in execution can be forged.

Summary

2015 is going to be a banner year for mixed-signal design and verification methodologies. Those that have forged ahead are in a position of execution advantage. Those that have not will be scrambling to catch up, but with the benefits of following a path that has been proven by many market leaders.

The IC6.1.8 ISR10 and ICADVM18.1 ISR10 production releases are now available for download.(read more)