A photoresist composition. The composition has the following: (a) one or more resin binders that include one or more acid sensitive groups and that are substantially free of phenolic groups protected by acetal or ketal groups; (b) one or more photo acid generators, that, upon exposure to a source of high energy, decompose and generate a photoacid strong enough to remove the one or more acid sensitive groups; (c) one or more ionic non-photosensitive additives including an iminium salt; and (d) one or more solvents. There is also a process for patterning relief structures on a substrate employing the photoresist composition.

Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a compound that when exposed to actinic rays or radiation, generates an acid, (B) a resin that when acted on by an acid, increases its rate of dissolution in an alkali developer, and (C) a hydrophobic resin, wherein the hydrophobic resin (C) contains a repeating unit derived from any of monomers of general formula (1) below.

A negative resist composition, includes: (A) an alkali-soluble polymer containing a specific repeating unit as defined in the specification; (B) a crosslinking agent capable of crosslinking with the alkali soluble polymer (A) under an action of an acid; (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (D) a specific quaternary ammonium salt as defined in the specification; and (E) an organic carboxylic acid, and a pattern forming method uses the composition.

An enhanced self-writing method for generating in-plane (horizontally-oriented) polymer lightguides that includes disposing one or more light deflecting structures in or on the upper surface of a uncured layer that deflect incident collimated light beams in a transverse direction (i.e., parallel to the uncured layer top layer surface), whereby the deflected collimated light beam polymerizes a corresponding elongated portion of the uncured material in a self-propagating manner to form in-plane polymer lightguides. When used in the fabrication of micro-truss structures, the in-plane polymer lightguides are linked to diagonal polymer lightguides to form superior truss configurations, such as that of the ideal octet-truss structure. Non-polymerized portions of the uncured layer are removed to expose the micro-truss structure for further processing.

Disclosed are methods for making read sensors using developable bottom anti-reflective coating and amorphous carbon (a-C) layers as junction milling masks. The methods described herein provide an excellent chemical mechanical polishing or planarization (CMP) stop, and improve control in reader critical physical parameters, shield to shield spacing (SSS) and free layer track width (FLTW).

A resin composition for forming an optical waveguide brings together excellent bending resistance, a low refractive index, and low tackiness suitable for a roll-to-roll (R-to-R) process as a material for forming an optical waveguide, in particular, a material for forming a clad layer. The resin composition for forming an optical waveguide to be used in formation of an optical waveguide includes a polyvinyl acetal compound having a structural unit represented by the following general formula (1) as a main component: in the formula (1), R represents an alkyl group having 1 to 3 carbon atoms, and k, m, and n represent ratios of respective repeating units in a main chain and each represent an integer of 1 or more.

An extreme ultraviolet lithography (EUVL) process is performed on a target, such as a semiconductor wafer, having a photosensitive layer. The method includes providing a one-dimensional patterned mask along a first direction. The patterned mask includes a substrate including a first region and a second region, a multilayer mirror above the first and second regions, an absorption layer above the multilayer mirror in the second region, and a defect in the first region. The method further includes exposing the patterned mask by an illuminator and setting the patterned mask and the target in relative motion along the first direction while exposing the patterned mask. As a result, an accumulated exposure dose received by the target is an optimized exposure dose.

A method includes scanning a lithography mask with a repair process, and measuring back-scattered electron signals of back-scattered electrons generated from the scanning. An endpoint is determined from the back-scattered electron signals. A stop point is calculated from the endpoint. The step of scanning is stopped when the calculated stop point is reached.

Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin prepared by a phosphorous-containing diamine represented by the following Chemical Formula 1, (B) a photosensitive diazoquinone compound, and (C) a solvent. A photosensitive resin film prepared using the same and a semiconductor device including the photosensitive resin film are also disclosed. In Chemical Formula 1, each substituent is the same as defined in the detailed description.

A solution of a gallium phthalocyanine contains a compound of formula (1) and a gallium phthalocyanine of formula (2), H2N—CH2—R1—CH2—NH2 (1) wherein R1 represents a single bond, or a substituted or unsubstituted alkylene group having 1 to 10 main-chain carbon atoms, a substituent of the substituted alkylene group is an alkyl group having 1 to 3 carbon atoms, an alkyl group having 1 to 3 carbon atoms and being substituted with an amino group, or a hydroxy group, one of the carbon atoms in the main chain of the alkylene group may be replaced with an oxygen atom, a sulfur atom, or a bivalent group represented by the formula —NR2—, and R2 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or an alkyl group having 1 to 3 carbon atoms and being substituted with an amino group, and wherein X1 represents a chlorine atom or hydroxy group.

A resist composition including a base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon exposure, the acid-generator including an acid generator consisting of a compound represented by general formula (b1-1) shown below: In which RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).

A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.

The present invention provides a polymerizable tertiary ester compound represented by the following general formula (1a) or (1b). There is provided a polymerizable ester compound useful as a monomer for a base resin of a resist composition having a high resolution and a reduced pattern edge roughness in photolithography using a high-energy beam such as an ArF excimer laser light as a light source, especially in immersion lithography, a polymer containing a polymer of the ester compound, a resist composition containing the polymer as a base resin, and a patterning process using the resist composition.

An additive polymer comprising recurring styrene units having an ester group bonded to a CF3—C(OR2)—R3 group (wherein R2 is H, acyl or acid labile group, R3 is H, CH3 or CF3) such as 1,1,1,3,3,3-hexafluoro-2-propanol is added to a polymer capable of increasing alkali solubility under the action of acid to formulate a resist composition. The resist composition can minimize outgassing from a resist film during the EUV lithography and form a resist film having a hydrophilic surface sufficient to prevent formation of blob defects on the film after development.

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below. In the formula, R1 represents a hydrocarbon group of 4 to 20 carbon atoms which may have a substituent; Y1 represents a single bond or a divalent linking group; R2 and R3 each independently represents a substituent of 0 to 20 carbon atoms other than a fluorine atom; one of R2 and R3 may form a ring with Y1; Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.

The present invention relates to a developable bottom antireflective coating (BARC) composition and a pattern forming method using the BARC composition. The BARC composition includes a first polymer having a first carboxylic acid moiety, a hydroxy-containing alicyclic moiety, and a first chromophore moiety; a second polymer having a second carboxylic acid moiety, a hydroxy-containing acyclic moiety, and a second chromophore moiety; a crosslinking agent; and a radiation sensitive acid generator. The first and second chromophore moieties each absorb light at a wavelength from 100 nm to 400 nm. In the patterning forming method, a photoresist layer is formed over a BARC layer of the BARC composition. After exposure, unexposed regions of the photoresist layer and the BARC layer are selectively removed by a developer to form a patterned structure in the photoresist layer. The BARC composition and the pattern forming method are especially useful for implanting levels.

A microstructure manufacturing method includes forming a layer of a photosensitive resin on a substrate surface having an electrical conductivity, forming a structure of the photosensitive resin by exposing the layer of the photosensitive resin to light and developing the layer of the photosensitive resin to expose a part of the substrate surface, forming a first plated layer on the exposed part of the substrate surface by soaking the structure of the photosensitive resin in a first plating solution, curing the structure of the photosensitive resin after forming the first plated layer, removing at least part of the first plated layer after curing the structure of the photosensitive resin, and forming a second plated layer on a part where the first plated layer is removed, by soaking the structure of the photosensitive resin in a second plating solution different from the first plating solution.

A method for forming patterns of a semiconductor device includes providing a photomask that includes an array of contact holes in an active region, a plurality of first dummy contact holes for restricting pattern distortion of the contact holes in an area outside of the array of the contact holes, a plurality of first assist features for restricting pattern distortion of the first dummy contact holes disposed inside a corresponding one of the first dummy contact holes, and an array of second assist features for additionally restricting pattern distortion of the first dummy contact holes. The array of second assist features is disposed outside of the first dummy contact holes. The method also includes forming an array of contact holes and first dummy contact holes on a wafer by using the photomask as an exposure mask.

A method of tilting liquid crystal molecules is presented. The method entails providing a substrate including a photoalignment layer on top of a layer of liquid crystal molecules. The photoalignment layer is exposed to patterned light that is incident on the substrate at a substantially normal angle. The patterned light is polarized in a polarization direction that is non-parallel to an incident surface of the substrate.

Disclosed is a resist ink having superior acid-resistance and coupling property, the resist ink composed of 70% or less by weight of solvent, 10-15% by weight of base polymer, 10-15% by weight of tacktifier, 3% or less by weight of additive, and 1-10% by weight of coupling agent.

A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Provided by the present invention is a method including: (1) forming a resist underlayer film on the upper face side of a substrate to be processed using a composition for forming a resist underlayer film, the composition containing (A) a compound having a group represented by the following formula (1); (2) forming a resist coating film by applying a resist composition on the resist underlayer film; (3) exposing the resist coating film by selectively irradiating the resist coating film with a radiation; (4) forming a resist pattern by developing the exposed resist coating film; and (5) forming a predetermined pattern on the substrate to be processed by sequentially dry etching the resist underlayer film and the substrate using the resist pattern as a mask.

The present invention provides an exposure apparatus and an exposure method. The method comprises: utilizing an exposure light source to provide light rays to the photo-resist layer, wherein the light rays pass through the mask and the transparent substrate to reach the photo-resist layer; and utilizing a reflective plate to reflect the light rays passing through the transparent substrate and the photo-resist layer back to the photo-resist layer. The present invention can reduce a line space of a pattern of the photo-resist layer.

A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

For reading the frets of a stringed electronic musical instrument, a plurality of resistance wire strings are secured to a nut end and a bridge of the instrument, with the strings superposing in parallel relationship over a plurality of conducting frets mounted on a fingerboard on the instrument. The voltages produced by depressing the strings to the conducting frets, after being inverted and linearized, are quantized to levels representative of the particular frets to obviate the effects of contact resistance, and decision voltage levels are selected so as to account for such contact resistance. To enable the signals to be fed as conventional information through a MIDI channel to a synthesizer for generating frequencies corresponding to the signals, an analog to digital converter is used. The different components, as well as the digitized linearized signals, are selectively controlled and fed, respectively, to a microprocessor.

A reverb generator comprises a delay circuit for delaying an input audio signal, a feed back path connecting an output port of the delay circuit to its input port, and a phase shifter connected in series to the delay circuit. The phase shifter produces a dispersion in the spectrum of the input audio signal in accordance with frequency dependent delay characteristic in such a manner that the delay time is large in a low frequency range and small in a higher frequency range. By including the phase shifter in the feed back path, one can obtain an output audio signal having a spectrum which is repeatedly subjected to dispersion, thus simulating the effect of dispersion due to the multiple reflections taking place in an actual concert hall.

A stringed musical instrument comprises means by which the relation between displacement of a hinged string mounting member, such as a tremolo tail piece on which the tuners of the instrument are disposed, and the alteration of pitch of the strings thereof can be adjusted for each of the strings independently of the others. According to another feature of the invention the linear tuner blocks may be selectively released from engagement with the adjuster screws thereof for facilitating quick string mounting operations.

A fastener for quick-mounting a cymbal to an upright cymbal support rod comprising a pair of half-round sleeve members arranged in face-to-face relationship forming a cylindrical surface therebetween for grasping the cymbal mounting rod; a tab extending upward from each sleeve member including means for pivoting said members near said tabs so that, by squeezing said tabs together, said sleeve members are pivoted away from each other; a pair of split flange members, one attached to the lower end of each sleeve member, spaced apart from said tab, arranged in co-planar alignment when said members are in adjacent contact to form a planar compression surface for pressing toward a cymbal placed on the cymbal mounting rod; and, means for biasing said sleeve members into full contact about the cymbal mounting rod threaded end to hold the cymbal on the rod.

A method for electronically processing and storing musical information involves separating the musical information into a plurality of segments, each representing some portion of a measure, and assigning a sequential time dimension value to each segment. The musical information is also separated into plurality of channels, with each channel representing a sound source and having a sound dimension value assigned to it. The musical information for a given channel and segment is stored in a memory array by associating the musical information corresponding to a given channel and segment with the memory array node specified by the time dimension value and sound dimension value assigned to the given channel and segment.

A rotary valve assembly incorporated in a brass instrument for changing a pitch of a tone comprises a rotary valve housed in a valve casing having two groups of aeroports, and the rotary valve is provided with two air passages, one of which interconnects the aeroports in the first group and the other of which interconnects one aeroport of the first group and one aeroport of the second group, so that various arrangements are possible for the aeroports.

An apparatus for the carrying of a woodwind musical instrument, known as a recorder, consisting of a ring with sufficient inside diameter to fit around the shaft of the recorder and a strap attached to the ring and of sufficient length so as to fit around the neck of the person playing the recorder and allowing the recorder to hang in a position of easy access to the user.

Wind instrument includes a tubular body having a plurality of tone holes, and a plurality of keys capable of opening and closing the tone holes. Via a retaining member, detector units are provided within the tubular body in corresponding relation to the keys, and each of the detector units is generally opposed to the back surface of the corresponding key. Each of the detector units detects a relative distance to the back surface and outputs an electrical signal, on the basis of which an opening/closing state of the key can be detected. The retaining member, accommodated in the tubular body, positions and retains each of the detector units in such a manner that the keys and tubular body and the individual detector units are kept in non-contacting relation to each other.

A dual rotor axial-flow rotor valve structure includes a rotor valve seat for rotatably receiving rotatable first and second rotor valves. The rotor valve seat has a first and a second extension sections connected to end sections of a second and a first tuning slide assembly s. The first rotor valve communicates with end sections of first and second flow passages with a mouthpiece and the other end of the second tuning slide assembly and communicate the other end of the second flow passage with the first or second extension section. The second rotor valve communicates ends of the first and second flow passages with the other end of the first tuning slide assembly and a main tuning slide assembly and communicate the other end of the second flow passage with the first or second extension section.

A tremolo device for a stringed instrument is described in which a base plate is configured for surface mounting to a body of the instrument. A pivot plate is pivotally coupled to the base plate along an edge of the pivot plate. Each string is associated with a string seat. The string is threaded through the string seat receiving a terminal end of the string. The string seat includes a keyed portion that slidably attaches the string seat to the pivot plate in a keyed slot provided in a bottom surface of the pivot plate. A spring disposed between the base plate and the pivot plate maintains the pivot plate in a first position relative to the base plate until a user provides an action to pivot the pivot plate relative to said base plate. The spring returns the pivot plate to the first position when the user action is terminated.

Methods and apparatus are disclosed for interference mitigation of an open-access node. The method includes determining, at the open-access node, whether uplink interference from a mobile entity is above a threshold. The method includes adjusting a transmission power to trigger a hand-in of the mobile entity in response to determining the uplink interference is above the threshold. The method includes handing-in the mobile entity from a first cell in response to adjusting the transmission power. The method includes redirecting the mobile entity to a second cell different from the first cell.

A wireless access system and, more particularly, a method and apparatus for more efficiently performing zone switch are disclosed. The method of performing zone switch by an advanced mobile station (AMS) in a mixed-mode advanced base station (ABS) which operates in a mixed mode of a broadband wireless access system includes receiving a ranging response (RNG-RSP) message including system information of an AMS support zone from a legacy zone (LZone) of the ABS, and performing ranging to the AMS support zone using the system information.

A system may include a macro cell base station configured to determine a service quality associated with the macro cell base station; determine whether the service quality is below a quality threshold; and instruct a small cell base station to switch from a sleep mode to an awake mode, when the service quality is below the quality threshold. The system may further include a small cell base station, located within a coverage area of the macro cell base station, configured to enter an awake mode, when instructed to enter the awake mode by the macro cell base station; and inform the macro cell base station that the small cell base station is in awake mode. The macro cell base station may be further configured to hand over one or more user devices to the small cell base station, when the small cell base station is in the awake mode.

A method for operating a base station in a wireless communication system in order to support a plurality of characteristics is provided. The method includes allocating resource periods for respective characteristics, transmitting system information including information on the characteristics, transmitting a reference signal with the characteristic corresponding to the relevant resource period through at least one of the resource periods, and receiving feedback information determining channel qualities for all of the characteristics.

This specification describes a method and corresponding system for reducing aggregate forward link transmission power. In one arrangement, a RAN may reduce the aggregate transmission power level in a coverage area by (i) determining which WCDs in the coverage area have a communication error rate that is at least a threshold level of communication error rate, and in response to the determining, (ii) reducing the forward link transmission power level of the determined WCDs. In another arrangement, the RAN may reduce the aggregate transmission power level in a coverage area by reducing the forward link transmission power of WCDs in the coverage area that have (i) a forward link transmission power level that is at least a threshold level of forward link transmission power and (ii) a communication error rate that is at least a threshold level of communication error rate.

Method and Apparatus thereof, for controlling intercell interference in a radio communications system having a plurality of user equipment and a plurality of access nodes including the steps of: a user equipment of said plurality connected to a serving access node, upon determining that an access node of said plurality is causing interference, transmitting a request to said serving access node; said serving access node forwarding said request to an apparatus controlling said interfering access node over an X2 interface, and said apparatus, instructing said interfering access node to execute said request.

A method includes selecting a subset k of N accessible antennas to use to process a transmission received at the N antennas and sent by a user equipment, and processing the transmission from the user equipment at least by using baseband information from the k antennas. An apparatus includes one or more processors and one or more memories including computer program code. The one or more memories and the computer program code are configured to, with the one or more processors, cause the apparatus to perform at least the following: selecting a subset k of N accessible antennas to use to process a transmission received at the N antennas and sent by a user equipment; and processing the transmission from the user equipment at least by using baseband information from the k antennas. Additional apparatus, computer programs, and computer program products are disclosed.

Method and arrangement for network resource management in a communication network, especially related to transfer of content. A content resource broker is introduced, which dynamically manages resources based on the size of the content to be transferred. The method and arrangement involve the obtaining of information on current and future network capacity, which is available for transfer of content; the receiving of a request from a requesting entity concerning resources for transfer of a content C; and the determining of whether the available network capacity within a predetermined response time is sufficient for transferring the content C before the predetermined response time has expired.

A method for tracking a user's movements between network addresses can include, subsequent to a request for a (current) network address from a user, receiving the network address and an identifier for a region associated with the network address. The method can also include locating a record that contains the identifier for the region and a time that immediately precedes the request for the network address from the user. The record may further contain a prior network address. The method can further include generating an entry for a table that includes the identifier for the region, the current network address, and the prior network address. A server computer or a client computer can generate the entry. Improved accountability and improved user profile accuracy can be obtained with the method. A data processing system readable medium can comprise code that includes instructions for carrying out the method.

A virtual computer system includes virtualization software, and one or more physical network interfaces for connecting to one or more computer networks. The virtualization software supports one or more virtual machines (VMs), and exports one or more virtual network interfaces to the VM(s) to enable the VM(s) to access the computer network(s) through the physical network interface(s). The virtualization software modifies and filters network data frames from the VM(s) and from the physical network interface(s) to restrict one or more VMs to one or more virtual local area networks (VLANs) that are implemented within a VLAN topology. Restricting a VM to a VLAN limits the broadcast domain to which the VM belongs, which may reduce security risks facing the VM. Implementing the VLAN functionality within the virtualization software provides the functionality to every VM in the computer system, without requiring every VM to provide the functionality.

A method and apparatus in which multiple Internet Protocol (IP) based wireless data transmissions are simultaneously provided between a wireless device and a server, including providing multiple antennas, multiple T/R units, multiple processors and multiple I/O ports on the wireless device. The method includes receiving multiple IP data packets on the I/O ports at substantially the same time, and sending multiple data packets from the wireless device to the server, whereby the transmission rate between the wireless device and the server is increased.

A system and method can support a flooding mechanism using a multicast group in a middleware machine environment. The middleware machine environment can comprise a gateway instance that includes an external port for receiving one or more data packets from an external network. The middleware machine environment also comprises one or more host servers, each of which is associated with one or more virtual machines that can process the data packets. Furthermore, said host servers can provide virtual interfaces that belong to a virtual hub associated with the gateway instance. At least one said packet is a flooded packet that is specified with an unknown destination address when it is received at the external port. The gateway instance operates to send the flooded packet to the multicast group that operates to forward the flooded packet to one or more said host servers in the multicast group.

In one exemplary embodiment, a method includes: transmitting a value from an access node towards an apparatus, where the value is indicative of a size of a first portion of an uplink resource block, where the uplink resource block is shared among a plurality of apparatus, where the first portion is specified for transmission of a first type of signaling to the access node, where a second portion of the uplink resource block is specified for transmission of a second type of signaling to the access node; and receiving at least one transmission using at least one of the first portion and the second portion.

An abnormality detection unit provided in at least one node among a plurality of nodes included in an information processing apparatus detects abnormality in a data transmission path of data transmission using a shared memory area sharable in a single node and other node, which is included in the storage unit provided in the single node or other nodes. An error information generation unit provided in the single node generates error information, based on the abnormality detected by the abnormality detection unit, and generates an interrupt with respect to a processor within a self node. The processor provided in the single node performs recovery processing, based on the error information according to the interrupt.

In general, to provide acknowledgment information by a first wireless device, the first wireless device sends repeated instances of acknowledgment information in respective first and second frame structures, in response to receipt of first information from a second wireless device. In addition, the first wireless device also sends further acknowledgment information in the second frame structure that is responsive to second information received from the second wireless device.

A communications method implemented in a transmission point (TP) used in a coordinated multipoint transmission and reception (CoMP) system is disclosed. The communications method comprises transmitting, to a user equipment (UE), attributers for up to four indicators indicating at least physical downlink shared channel (PDSCH) resource element (RE) mapping, and transmitting, to the UE, one of the four indicators, each of which is conveyed in 2 bits, wherein the four indicators comprises ‘00’, ‘01’, ‘10’, and ‘11’ corresponding to a first set, a second set, a third set, and a fourth set of parameters, respectively. Other methods, apparatuses, and systems are also disclosed.