d

Physics-based reliability model for large-scale CMOS circuit design

This disclosure relates generally to systems and methods for simulating physical active semiconductor components using in silico active semiconductor components. To simulate charge degradation effect(s) in a circuit simulation, a simulated defect signal level is produced. More specifically, the simulated defect signal level simulates at least one charge degradation effect in the in silico active semiconductor component as a function of simulation time and a simulated input signal level of a simulated input signal. As such, the charge degradation effect(s) are simulated externally with respect to the in silico active semiconductor component. In this manner, the in silico active semiconductor component does not need to be reprogrammed in order to simulate charge degradation effects.




d

Crosstalk analysis method

One implementation of the disclosure provides a crosstalk analysis method executed by a computer. The method includes steps of: executing a layout program; executing a crosstalk analysis program; acquiring, by the crosstalk analysis program, a plurality of parameters from a layout result generated by the layout program; estimating a crosstalk value according to the parameters; determining whether the crosstalk value is larger than a predetermined value; providing a layout suggestion table when the crosstalk value is larger than the predetermined value.




d

Semiconductor device

A method for bypassing a defective through silicon via x in a group of n adjacent through silicon vias, includes receiving a plurality of relief signals to identify the defective through silicon via x, activating x−1 switch circuits to connect x−1 data circuits to through silicon vias 1 to x−1 in the group of n adjacent through silicon vias, activating n-x switch circuits to connect n-x data circuits to through silicon vias x+1 to n in the group of n adjacent through silicon vias, and activating a switch circuit to connect a data circuit to an auxiliary through silicon via which is adjacent through silicon via n in the group of n adjacent through silicon vias.




d

Semiconductor device design method and design apparatus

A relationship between distance from a back bias control section which outputs a control signal for controlling a back bias of a transistor and an amount of noise in the control signal outputted from the back bias control section is found. An increase of jitter corresponding to the amount of the noise in a clock transmitted on a clock path connected to a circuit section (IP macro) is found on the basis of the relationship between the distance from the back bias control section and the amount of the noise. The circuit section and the clock path are placed on the basis of the increase of the jitter and an allowable jitter value for the circuit section.




d

Method of optimizing capacitive couplings in high-capacitance nets in simulation of post-layout circuits

A method of asymmetric asynchronous decoupling of capacitors in an integrated circuit design is provided for faster simulation by circuit simulators, e.g. FastSPICE circuit simulators. This method includes removing a coupling capacitor from a list, which includes coupling capacitors that capacitively couple two nets in the design. The two nets have capacitances C1 and C2, and at least one of capacitances C1 and C2 exceeds a threshold. The coupling capacitor has capacitance Cc. When coupling capacitance Cc is low and only one of capacitances C1 and C2 has a low capacitance, then a forward capacitance can be used at whichever of the two nets has the low capacitance and a lump capacitance can be used at the other net for simulation. When coupling capacitance Cc is low and both of capacitances C1 and C2 have high capacitances, then lump capacitances can be used at the two nets for the simulation.




d

Method and system for three-dimensional layout design of integrated circuit elements in stacked CMOS

A method includes providing a design of a semiconductor device such as a stacked CMOS device comprising a plurality of circuit elements to be assigned into a layout of a plurality of tiers, and identifying at least one first type of circuit element within the plurality of circuit elements based on at least one predetermined criterion. Each respective one of the at least one first type of circuit element is to be assigned to a respective designated one of the plurality of tiers. The method further includes dividing the remainder of the plurality of circuit elements into at least two groups of circuit elements based on circuit density, and assigning the at least one first type of circuit element and the at least two groups of circuit elements to respectively different ones of the plurality of tiers of the semiconductor device.




d

Scan chain modification for reduced leakage

A leakage power control vector is loaded into existing test scan chain elements for application to circuit elements of a circuit in which the leakage currents are to be controlled. The vector is designed to configure the circuit elements into states in which leakage currents are reduced. A multiplexer selects the power control vector for loading into the scan chain elements, and a clock generator clocks the configuration vector into the scan chain elements. A sleep mode detector may be provided to configure the multiplexer to select the power control vector and to operate the clock generator to clock the power control vector into the scan chain elements when a sleep mode of the circuit is detected.




d

System and method for integrated transformer synthesis and optimization using constrained optimization problem

A method for designing a transformer in an integrated circuit includes receiving one or more desired characteristics of the transformer from user input and iteratively determining a design solution for the transformer through one or more simulations and modifications using a rule-set. The method combines the one or more desired characteristics with other preset characteristics of the transformer or the integrated circuit. A first model of the transformer is defined with typical load impedances and simulated having the combined characteristics to determine performance. Results of the simulation are processed to calculate performance with the load impedances specified by the user. The results are further processed to obtain a mathematical model that includes tuning capacitors. The first and subsequent models are modified by drawing on a rule-set of expert knowledge relating to general dependency of at least one design criterion, such as a physical, geometrical or performance characteristic, with another design criterion.




d

Programmable clock spreading

An integrated circuit having a programmable clock spreader configured to generate a plurality of controllably skewed clock signals, each applied to a corresponding region within the integrated circuit with circuitry configured to be triggered off the applied clock signal. The programmable clock spreader is designed to enable customization of the current-demand characteristics exhibited by the integrated circuit, e.g., based on the circuit's spectral impedance profile, to cause transient voltage droops in the power-supply network of the integrated circuit to be sufficiently small to ensure proper and reliable operation of the integrated circuit.




d

Generating guiding patterns for directed self-assembly

Aspects of the invention relate to techniques of generating guiding patterns for via-type feature groups. A guiding pattern may be constructed for a via-type feature group that comprises two or more via-type features in a layout design. A backbone structure may then be determined for the guiding pattern. Based on the backbone structure and a self-assembly model, simulated locations of the two or more via-type features are computed. The simulated locations are compared with targeted locations. If the simulated locations do not match the targeted locations based on a predetermined criterion, the simulated locations adjusted to derive modified locations. Using the modified locations, the above operations may be repeated until the simulated locations match the targeted location based on a predetermined criterion or for a predetermined number of times.




d

Integrated circuit floorplan for compact clock distribution

An integrated circuit includes core logic and a plurality of interface blocks disposed about a periphery of the core logic. A plurality of input or output (I/O) circuits is assigned to one of the plurality of interface blocks. The I/O circuits include external I/O circuits coupled to a device other than the integrated circuit and internal I/O circuits coupled to the integrated circuit. Each interface block includes a first plurality of I/O circuits disposed on a first side of the interface block and a second plurality of I/O circuits disposed on a second side of the interface block. Each interface block also includes interface logic for the interface block between the first plurality of I/O circuits and the second plurality of I/O circuits, and a logic hub that includes a clock distribution of minimal length that drives launch logic and capture logic to form the I/O circuits of the interface block.




d

Method and system for forming patterns with charged particle beam lithography

In a method for fracturing or mask data preparation or mask process correction for charged particle beam lithography, a plurality of shots are determined that will form a pattern on a surface, where shots are determined so as to reduce sensitivity of the resulting pattern to changes in beam blur (βf). In some embodiments, the sensitivity to changes in βf is reduced by varying the charged particle surface dosage for a portion of the pattern. Methods for forming patterns on a surface, and for manufacturing an integrated circuit are also disclosed, in which pattern sensitivity to changes in βf is reduced.




d

Interconnection substrate design supporting device, method of designing interconnection substrate, program, and interconnection substrate

A via disposition information acquiring unit acquires via disposition information indicating a disposition of the plurality of first vias (212). A second conductor information acquiring unit acquires second conductor information indicating disposition positions of a plurality of second conductors (232) repeatedly disposed in the second conductor layer (230). A via extracting unit extracts an extraction via with respect to each of the plurality of second conductors (232). The extraction via is each of the first vias (212) overlapping the second conductor (232). A via selecting unit selects a selection via with respect to each of the plurality of second conductors (232). The selection via is each of first vias (212) selected in a predetermined number from the extraction vias. An opening introducing unit introduces a first opening (234) to each of the plurality of second conductors (232). The first opening (234) overlaps the extraction via not selected by the via selecting unit in plan view.




d

Method and system for semiconductor design hierarchy analysis and transformation

A method and apparatus for partitioning of the input design into repeating patterns called template cores for the application of reticle enhancement methods, design verification for manufacturability and design corrections for optical and process effects is accomplished by hierarchy analysis to extract cell overlap information. Also hierarchy analysis is performed to extract hierarchy statistics. Finally template core candidates are identified. This allows to the design to be made amenable for design corrections or other analyses or modifications that are able to leverage the hierarchy of the design since the cell hierarchy could otherwise be very deep or cells could have significant overlap with each other.




d

Method and system for critical dimension uniformity using charged particle beam lithography

A method for mask data preparation or mask process correction is disclosed in which a set of charged particle beam shots is determined which is capable of forming a pattern on a surface, wherein critical dimension uniformity (CDU) of the pattern is optimized. In some embodiments the CDU is optimized by varying at least two factors. In other embodiments, model-based techniques are used. In yet other embodiments, the surface is a reticle to be used in an optical lithographic process to form a pattern on a wafer, and CDU on the wafer is optimized.




d

Automated integrated circuit design documentation

A method of creating a datasheet includes obtaining integrated circuit data from at least one data source, creating a data structure including the integrated circuit data obtained from the at least one data source, and creating a datasheet using data contained in the data structure. The datasheet is created in a human-readable format.




d

Network synthesis design of microwave acoustic wave filters

Methods for the design of microwave filters comprises comprising preferably the steps of inputting a first set of filter requirements, inputting a selection of circuit element types, inputting a selection of lossless circuit response variables, calculating normalized circuit element values based on the input parameters, and generate a first circuit, insert parasitic effects to the normalized circuit element values of the first circuit, and output at least the first circuit including the post-parasitic effect circuit values. Additional optional steps include: requirements to a normalized design space, performing an equivalent circuit transformation, unmapping the circuit to a real design space, performing a survey, and element removal optimization. Computer implement software, systems, and microwave filters designed in accordance with the method are included.




d

Method and apparatus for generating gate-level activity data for use in clock gating efficiency analysis

A mechanism for generating gate-level activity data for use in clock gating efficiency analysis of an integrated circuit (IC) design is provided. Generating the gate-level activity data includes generating a signal behaviour description for inter-register signals, generating a gate-level netlist for the IC design, generating gate-level stimuli based at least partly on the generated signal behaviour description, and performing gate-level simulation using the generated gate-level stimuli to generate gate-level activity data for the IC design. In one embodiment, generating the signal behaviour description includes performing Register Transfer Level (RTL) simulation of the IC design, and generating the gate-level netlist includes performing RTL synthesis. The RTL simulation and RTL synthesis are performed on RTL data for the IC design.




d

Prediction of dynamic current waveform and spectrum in a semiconductor device

A method for accurately determining the shape of currents in a current spectrum for a circuit design is provided. The method includes determining timing and power consumption characteristics. In one embodiment, timing characteristics are provided through a electronic design automation tool. The timing characteristics yield a current pulse time width. In another embodiment, power consumption characteristics are provided by an EDA tool. The power consumption characteristics yield a current pulse amplitude. The shape of the current pulse is obtained by incrementally processing a power analyzer tool over relatively small time increments over one or more clock cycles while capturing the switching nodes of a simulation of the circuit design for each time increment. In one embodiment, the time increments are one nanosecond or less.




d

System and method for containing analog verification IP

A system, method, and computer program product for containing analog verification IP for circuit simulation. Embodiments introduce analog verification units (“vunits”), and corresponding analog verification files to contain them. Vunits allow circuit design verification requirement specification via text file. No editing of netlist files containing design IP is required to implement static and dynamic circuit checks, PSL assertions, clock statements, or legacy assertions. Vunits reference a top-level circuit or subcircuits (by name or by specific instance), and the simulator automatically binds vunit contents appropriately during circuit hierarchy expansion. Vunits may be re-used for other design cells, and may be easily processed by text-based design tools. Vunits may be provided via vunit_include statements in a control netlist file, command line arguments, or by directly placing a vunit block into a netlist. Vunits may also contain instance statements to monitor or process signals, such as those needed by assertions.




d

Early design cycle optimization

Some example embodiments include a computer-implemented method for designing an integrated circuit. The computer-implemented method includes receiving a hierarchical network design for the integrated circuit, wherein the hierarchical design comprises a number of components that are coupled together. The computer-implemented method includes detecting that a component of the number of components has at least one of failed timing and incomplete timing based on a problem that comprises at least one of a missing assertion, one or more missing latches, a source driver having an input source slew that is greater than a source slew limit threshold, and a sink having an input sink slew that is greater than a sink slew limit threshold. The computer-implemented method includes replacing the component with a different component that is independent of the problem and testing others components of the number of components based on the different component.




d

DRC format for stacked CMOS design

The present disclosure relates a method of performing a design rule checking (DRC) procedure on a multi-tiered integrated chip. In some embodiments, the method is performed by defining layer databases for a plurality of tiers within a multi-tiered integrated chip. The layer databases respectively identify design layers within an associated tier. A DRC (design rule checking) deck is then generated, which defines one or more individual design layer definitions as a function of a plurality of layer databases, so that the one or more individual design layer definitions are defined for a plurality of tiers. One or more design rules for the one or more individual design layer definitions are defined within the DRC deck. Since the individual design layer definitions are defined as functions of the plurality of layer databases, the design rules apply to the plurality of tiers.




d

Load balancing on hetrogenous processing cluster based on exceeded load imbalance factor threshold determined by total completion time of multiple processing phases

Methods and systems for managing data loads on a cluster of processors that implement an iterative procedure through parallel processing of data for the procedure are disclosed. One method includes monitoring, for at least one iteration of the procedure, completion times of a plurality of different processing phases that are undergone by each of the processors in a given iteration. The method further includes determining whether a load imbalance factor threshold is exceeded in the given iteration based on the completion times for the given iteration. In addition, the data is repartitioned by reassigning the data to the processors based on predicted dependencies between assigned data units of the data and completion times of a plurality of the processers for at least two of the phases. Further, the parallel processing is implemented on the cluster of processors in accordance with the reassignment.




d

Magnetic tunnel junction device and fabrication

A method of forming a magnetic tunnel junction (MTJ) device includes forming a first MTJ cap layer on a MTJ structure. The first MTJ cap layer includes a first non-nitrified metal. The method also includes forming a second MTJ cap layer over the first MTJ cap layer. The second MTJ cap layer includes a second non-nitrified metal. The method further includes forming a top electrode layer over the second MTJ cap layer. The second MTJ cap layer is conductive and configured to reduce or prevent oxidation.




d

Method and system for forming high accuracy patterns using charged particle beam lithography

A method and system for optical proximity correction (OPC) is disclosed in which a set of shaped beam shots is determined which, when used in a shaped beam charged particle beam writer, will form a pattern on a reticle, where some of the shots overlap, where the pattern on the reticle is an OPC-corrected version of an input pattern, and where the sensitivity of the pattern on the reticle to manufacturing variation is reduced. A method for fracturing or mask data preparation is also disclosed.




d

Circuit design support method, computer product, and circuit design support apparatus

A circuit-design support method includes obtaining information for a circuit having a logic circuit in which signal lines are connected to input terminals, signals of the signal lines being output via the logic circuit; obtaining information concerning a control circuit that has a first flip-flop for scanning and that can control a value of a given signal line by a value set by the first flip-flop; selecting, based on the circuit information, a second flip-flop at an output destination of a signal from the logic circuit, among second flip-flops of the circuit; and generating, based on the control circuit information, information indicating a serial connection of the control circuit between an output source of the signal of the given signal line and the given signal line and a connection of a data input terminal of the first flip-flop and an output terminal of the selected second flip-flop.




d

Integrated circuit design verification through forced clock glitches

A technique for determining whether an integrated circuit design is susceptible to glitches includes identifying storage elements in an original register-transfer level (RTL) file of the integrated circuit design and identifying clock signals for each of the storage elements in the original RTL file. The technique also includes generating respective assertions for each of the identified clock signals and identifying potential glitchy logic in respective clock paths for each of the identified clock signals. Finally, the technique includes inserting, at the potential glitchy logic, glitches in each of the respective clock paths of the original RTL file to provide a modified RTL file and executing an RTL simulation using the modified RTL file and the respective assertions.




d

Machine-learning based datapath extraction

A datapath extraction tool uses machine-learning models to selectively classify clusters of cells in an integrated circuit design as either datapath logic or non-datapath logic based on cluster features. A support vector machine and a neural network can be used to build compact and run-time efficient models. A cluster is classified as datapath if both the support vector machine and the neural network indicate that it is datapath-like. The cluster features may include automorphism generators for the cell clusters, or physical information based on the cell locations from a previous (e.g., global) placement, such as a ratio of a total cell area for a given cluster to a half-perimeter of a bounding box for the given cluster.




d

Placement based arithmetic operator selection

Methods and systems are described for placing arithmetic operators on a programmable integrated circuit device (e.g., a PLD). Placement of arithmetic operators of a data flow graph in one of multiple regions (e.g., a region of DSP circuitry blocks or a region of logic fabric circuitry) on the programmable integrated circuitry device may be determined (e.g., randomly). A score related to the performance of the graph (e.g., a score related to data flow graph routing delays or area consumed by the data flow graph) may be determined and this process may be repeated after one of the arithmetic operators of the data flow graph is moved. The placement of arithmetic operators that corresponds to the best value for the score related to the performance of the data flow graph may be stored. Accordingly, more arithmetic operators may be included on a programmable integrated device than in conventional devices.




d

Fabrication of a magnetic tunnel junction device

A magnetic tunneling junction device and fabrication method is disclosed. In a particular embodiment, a non-transitory computer-readable medium includes processor executable instructions. The instructions, when executed by a processor, cause the processor to initiate deposition of a capping material on a free layer of a magnetic tunneling junction structure to form a capping layer. The instructions, when executed by the processor, cause the processor to initiate oxidization of a first layer of the capping material to form a first oxidized layer of oxidized material.




d

Methods, systems, and articles of manufacture for implementing physical design using force models with custom connectivity

Disclosed are methods, systems, and articles of manufactures for implementing physical designs by using multiple force models to iteratively morph a layout decomposition. In addition to attractive force model(s) or repulsive force model(s), the physical implementation also uses a containment force model for grouping multiple design blocks or for confining a node of a cell within the boundary of a container. Another aspect is directed at deriving a first force model at the first hierarchical level from a second force model at the second hierarchical level by directly modifying the second model based at least in part on characteristic(s) of the first hierarchical level and of the second hierarchical level. In a design with multiple hierarchies, a cell-based force model is also used to ensure child nodes of a parent cell stay within a close proximity of the parent node of the parent cell.




d

Routing interconnect of integrated circuit designs with varying grid densities

Routing methods for an integrated circuit design layout are disclosed. The layout can include design netlists and library cells. A multiple-level global routing can generate topological wire for each net. An area oriented graph-based detail routing on the design can be performed. A post route optimization after the detail routing can be performed to further improve the routing quality. Some methods can be single threaded all or some of the time, and/or multi-threaded some or all of the time.




d

Density-based integrated circuit design adjustment

The disclosed technology is related to adjusting an integrated circuit design while accounting for a local density of the design. In particular exemplary embodiments, a local density value for a layout design that defines a plurality of geometric shapes is derived. Subsequently, one or more of the geometric shapes are adjusted such that the local density value is preserved. With some implementations, the local density value is preserved if the adjusted local density value is within a threshold amount of the derived local density value.




d

Defect injection for transistor-level fault simulation

Aspects of the invention relate to techniques of defect injection for transistor-level fault simulation. A circuit element in a circuit netlist of a circuit is first selected for defect injection. Next, a defect is determined based on whether the selected circuit element is a design-intent circuit element or a parasitic circuit element. After the defect is determined, the defect is injected into the circuit netlist and then the circuit is simulated.




d

Resist remover composition and method for removing resist using the composition

The present invention is directed to provide a resist remover composition for semiconductor substrate which enables to remove a resist simply and easily in the photolithography process in the semiconductor field, and a method for removing a resist comprising that the composition is used. The present invention relates to a resist remover composition for semiconductor substrate, comprising [I] a carbon radical generating agent, [II] an acid, [III] a reducing agent, and [IV] an organic solvent, and having pH of lower than 7, and a method for removing a resist, comprising that the composition is used.




d

Low-VOC cleaning substrates and compositions comprising a cationic biocide and glycol ether solvent

A cleaning composition for sanitizing and/or disinfecting hard surfaces, comprising: a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.




d

Branched alkoxylate surfactant composition

A composition is described containing a branched nonionic surfactant of Formula (I): (I) wherein x is a real number from 1 to 11, y is a real number from 1 to 20, R 1 is an alkyl group having 1 to 3 carbon atoms, R 2 is an alkyl group having 4 to 6 carbon atoms, and a primary 5 alcohol ethoxylate.




d

Personal care compositions with improved hyposensitivity

The present invention provides personal care compositions comprising a carrier and a mixture of essential oil components having specific levels of eucalyptol, terpene materials and auxiliary fragrance materials. The compositions herein gentle to skin and have a fragrance and activity similar if the composition were made using the pure extracted essential oil.




d

Solid fast draining/drying rinse aid for high total dissolved solid water conditions

The present invention is a solid rinse aid composition and methods of making and using the same. Applicants have surprisingly found that the crystal modifier sodium xylene sulfonate (short chain alkyl benzene or alkyl naphthalene sulfonates) at higher percentage can act as a solidification agent. The solid rinse aid composition generally includes an short chain alkyl benzene or alkyl naphthalene sulfonates solidification agent and an effective amount of a surfactant which can include a sheeting agent component, defoamer component and/or association disruption agent. The solid rinse aid composition may be phosphate-free, aminocarboxylate-free, and GRAS if desired.




d

Combination of crosslinked cationic and ampholytic polymers for personal and household applications

A cleansing composition for cosmetic or household use may include an ampholytic polymer; a crosslinked cationic polymer; a surfactant component selected from the group consisting of anionic surfactants, amphoteric surfactants, cationic surfactants, nonionic surfactants, and zwitterionic surfactants; and an aqueous and/or organic carrier.




d

Foamer composition and methods for making and using same

A new general purpose foaming agent having application as drilling fluid foaming agents or as any foaming agent needed an a wide variety of applications is disclosed, where the agent includes at least one anionic surfactant, at least one cationic surfactant, and mixtures thereof and one or more zwitterionic compounds. A method for using the foaming agent in capillary coiled tubing application is also disclosed. The foaming agents can also include additive to augment the properties of the foaming agent for a given application.




d

Liquid detergent composition

A liquid detergent composition containing (A) 10 to 70 mass % of a nonionic surfactant, (B) 1 to 15 mass % of an anionic surfactant, (C) 0.01 to 2 mass % of a protease, and (D) 0.001 to 0.1 mass % of at least one compound selected from the group consisting of thiazole-based compounds and sulfur-containing amino acids.




d

Mesitylene sulfonate compositions and methods thereof

The invention relates to compositions including a hypohalite or hypochlorous acid and a soluble salt of 2,4,6 mesitylene sulfonate. The compositions may include a surfactant, a buffer, or combinations thereof. Other adjuvants may also be present. Such compositions do not require the inclusion of high concentrations of sodium hydroxide or other soluble hydroxide salts to drastically increase pH (and thus stability), although such hydroxides may be present if desired.




d

Thickener containing a cationic polymer and softening composition containing said thickener, in particular for textiles

A method for softening laundry employs a softening composition, which includes at least one thickener containing a cationic polymer obtained by polymerization: of a cationic monomer;of a monomer with a hydrophobic nature, of formula (I): wherein R1=H or CH3 R2=alkyl chain having at least 16 carbon atomsX═O, m≧5, y=z=0, orX═NH, m≧z≧5, y=0, orX═NH, m≧y≧5, z=0, of a nonionic monomer.




d

Rinse-off compositions comprising lactoyl ethanolamine and a menthanecarboxamide compound

A rinse-off composition, such as a shampoo, hair conditioner or shower gel, comprising a rinse-off composition base, lactoyl ethanolamine and at least one compound selected from the group consisting of N-(4-cyanomethylphenyl) p-menthanecarboxamide and N-(2-pyridin-2-ylethyl) p-menthanecarboxamide. The compositions provide a pleasant, long-lasting cooling sensation.




d

Segmented soap bar with soap bodies forming concave arc surface

An elongated segmented soap bar is segmented longitudinally into a plurality of soap bodies separate and discrete from one another. Adjacent soap bodies are movable with respect to one another between at least two different configurations including at least an arc configuration with the plurality of soap bodies disposed in an arc. At least one coupler couples the plurality of soap bodies together to allow the adjacent soap bodies to move with respect to one another between the at least two different configurations.




d

Ferric hydroxycarboxylate as a builder

The use of ferric hydroxycarboxylate as a chelator and builder for cleaning compositions is disclosed. The cleaning composition may be formulated for warewashing, laundering, and for other means of removing soils and includes a ferric hydroxycarboxylate, an alkalinity source and a surfactant system. The cleaning composition has a pH of between about 9 and about 12.




d

Particle defoamer comprising a silicone emulsion and process for preparing same

A process for preparing a particle defoamer. The particle defoamer of 55%-75% of a carrier, 15%-35% of a silicone emulsion, 3%-10% of a texturing agent and 2%-10% of a solvent, based on the total weight of the particle defoamer; the process for preparing the particle defoamer is: (1)first adding a carrier A1 into a mixer, and then adding thereto a silicone emulsion B1, and stirring uniformly; (2)adding a carrier component A2 to the mixture obtained in (1), and stirring uniformly; (3)adding a silicone emulsion B2 to the mixture obtained in (2), and, after uniformly stirring, adding the solvent thereto and stirring uniformly; and (4)pelleting and drying by baking the mixture obtained in(3), so as to produce the product.




d

Non-corrosive oven degreaser concentrate

The invention relates to a non-corrosive degreasing concentrate and ready to use formulation. In particular, non-corrosive compositions capable of removing polymerized grease as effectively as some alkali metal hydroxide (i.e. caustic) based degreasers without requiring the use of personal protective equipment are disclosed.




d

Method of reducing soil redeposition on a hard surface using phosphinosuccinic acid adducts

Methods employing detergent compositions effective for reducing soil redeposition and accumulation on hard surfaces are disclosed. The detergent compositions employ phosphinosuccinic acid adducts in combination with an alkalinity source and gluconic acid or salts thereof, copolymers of acrylic acid and maleic acids or salts thereof, sodium hypochlorite, sodium dichloroisocyanurate or combinations thereof.