Provided is a method for manufacturing a liquid crystal display device that includes a photoalignment film. The photoalignment film is formed from a liquid crystal alignment agent, and aligns liquid crystal molecules horizontally to the main face of the at least one of the substrates. The liquid crystal alignment agent contains a solvent and at least two kinds of polyamic acids or their derivatives obtained by reacting diamine and tetracarboxylic dianhydride. At least two of the diamines and at least one of the tetracarboxylic dianhydrides are compounds represented by predetermined formulas. The method includes the steps of: (1) forming the film of the liquid crystal alignment agent; (2) pre-baking the film; (3) irradiating the pre-baked film with light; and (4) post-baking the irradiated film, the step (4) including an operation of post-baking the film multiple times at temperatures ranging from low to high temperatures.

Systems and methods for liquid deposition photolithography are described. In particular, some embodiments relate to systems and methods for using photolithography to control the 2D structure of a thin layer of material (e.g., photopolymer) using various masks, projection optics and materials. In one or more embodiments, this thin layer can be manipulated by micro-fluidic techniques such that it can be formed, patterned and post-processed in a liquid environment, vastly simplifying the creation of multi-layer structures. Multiple layers are rapidly built up to create thick structures of possibly multiple materials that are currently challenging to fabricate by existing methods.

An extreme ultraviolet lithography (EUVL) process is performed on a target, such as a semiconductor wafer, having a photosensitive layer. The method includes providing a one-dimensional patterned mask along a first direction. The patterned mask includes a substrate including a first region and a second region, a multilayer mirror above the first and second regions, an absorption layer above the multilayer mirror in the second region, and a defect in the first region. The method further includes exposing the patterned mask by an illuminator and setting the patterned mask and the target in relative motion along the first direction while exposing the patterned mask. As a result, an accumulated exposure dose received by the target is an optimized exposure dose.

Some embodiments include methods of forming patterns of openings. The methods may include forming spaced features over a substrate. The features may have tops and may have sidewalls extending downwardly from the tops. A first material may be formed along the tops and sidewalls of the features. The first material may be formed by spin-casting a conformal layer of the first material across the features, or by selective deposition along the features relative to the substrate. After the first material is formed, fill material may be provided between the features while leaving regions of the first material exposed. The exposed regions of the first material may then be selectively removed relative to both the fill material and the features to create the pattern of openings.

In a first thermal transfer portion of upstream side, a negative toner image forming portion forms on a photosensitive drum a desired negative toner image which reverses a desired positive toner image selected from all the toner images. The negative toner image forming portion then forms the desired negative toner image on a belt member. The first thermal transfer portion transfers a desired negative foil image from a foil sheet to the belt member so that a desired positive foil image remains on the foil sheet. A second transfer portion transfers the desired positive foil image thus remained on the desired positive toner image formed on the sheet of paper. A cleaning portion removes the desired negative toner image and the desired negative foil image from the belt member.

In a method for producing a cleaning blade, a first composition obtained by causing a reaction of diphenylmethane diisocyanate and a first aliphatic polyester polyol which has a number-average molecular weight of 2000 to 3500 and is used in an amount of 20 to 40 mol % relative to the diphenylmethane diisocyanate and a second composition containing a urethane rubber-synthesizing catalyst and a second aliphatic polyester polyol which has a number-average molecular weight of 2000 to 3500 and is the same as or different from the first aliphatic polyester polyol are mixed so that a relationship between a number of moles (MNCO [mol]) of an NCO group in the first composition and a number of moles (MOH [mol]) of an OH group in the second composition satisfies 0.05≦MOH/MNCO≦0.20.

A mask includes a substantially transparent portion. The mask further includes a halftone portion abutting the substantially transparent portion, a light transmittance of the halftone portion being greater than 0% and less than 100%. The mask further includes a blocking portion abutting the halftone portion, a light transmittance of the blocking portion being less than the light transmittance of the halftone portion.

A method includes scanning a lithography mask with a repair process, and measuring back-scattered electron signals of back-scattered electrons generated from the scanning. An endpoint is determined from the back-scattered electron signals. A stop point is calculated from the endpoint. The step of scanning is stopped when the calculated stop point is reached.

Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin prepared by a phosphorous-containing diamine represented by the following Chemical Formula 1, (B) a photosensitive diazoquinone compound, and (C) a solvent. A photosensitive resin film prepared using the same and a semiconductor device including the photosensitive resin film are also disclosed. In Chemical Formula 1, each substituent is the same as defined in the detailed description.

Provided are an electrophotographic photosensitive member in which leakage doesn't easily occur, a process cartridge and an electrophotographic apparatus each including the electrophotographic photosensitive member, and a method of manufacturing the electrophotographic photosensitive member. The electrophotographic photosensitive member includes a conductive layer including titanium oxide particle coated with tin oxide doped with a hetero element. When an absolute value of a maximum current amount flowing through the conductive layer in a case of performing a test of applying −1.0 kV including DC voltage to the conductive layer is defined as Ia, and an absolute value of a current amount flowing through the conductive layer in a case where a decrease ratio of a current amount per minute reaches 1% or less for the first time is defined as Ib, the relations of Ia≦6000 and 10≦Ib are satisfied. A volume resistivity of the conductive layer before the test is 1.0×108 Ω·cm to 5.0×1012 Ω·cm.

To provide an amine compound, represented by General Formula (I) below: [In General Formula (I), R1 and R2 represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted aralkyl group, or a substituted or unsubstituted aromatic hydrocarbon group, which may be identical or different; m and n are an integer of 1 or 0; Ar1 represents a substituted or unsubstituted aromatic hydrocarbon group; Ar2 and Ar3 represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted aralkyl group, or a substituted or unsubstituted aromatic hydrocarbon group; and Ar1 and Ar2 or Ar2 and Ar3 may bind to each other to form a substituted or unsubstituted heterocyclic group including a nitrogen atom.]

The present invention provides a carrier for a two-component electrophotographic developer, comprising a core particle and a thermoset silicone resin layer coated thereon, wherein said layer comprises a charge control agent and is formed by heat-treatment at a temperature below the melting point of said charge control agent.

A solution of a gallium phthalocyanine contains a compound of formula (1) and a gallium phthalocyanine of formula (2), H2N—CH2—R1—CH2—NH2 (1) wherein R1 represents a single bond, or a substituted or unsubstituted alkylene group having 1 to 10 main-chain carbon atoms, a substituent of the substituted alkylene group is an alkyl group having 1 to 3 carbon atoms, an alkyl group having 1 to 3 carbon atoms and being substituted with an amino group, or a hydroxy group, one of the carbon atoms in the main chain of the alkylene group may be replaced with an oxygen atom, a sulfur atom, or a bivalent group represented by the formula —NR2—, and R2 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or an alkyl group having 1 to 3 carbon atoms and being substituted with an amino group, and wherein X1 represents a chlorine atom or hydroxy group.

A resist composition including a base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon exposure, the acid-generator including an acid generator consisting of a compound represented by general formula (b1-1) shown below: In which RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).

A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.

The present invention provides a polymerizable tertiary ester compound represented by the following general formula (1a) or (1b). There is provided a polymerizable ester compound useful as a monomer for a base resin of a resist composition having a high resolution and a reduced pattern edge roughness in photolithography using a high-energy beam such as an ArF excimer laser light as a light source, especially in immersion lithography, a polymer containing a polymer of the ester compound, a resist composition containing the polymer as a base resin, and a patterning process using the resist composition.

An additive polymer comprising recurring styrene units having an ester group bonded to a CF3—C(OR2)—R3 group (wherein R2 is H, acyl or acid labile group, R3 is H, CH3 or CF3) such as 1,1,1,3,3,3-hexafluoro-2-propanol is added to a polymer capable of increasing alkali solubility under the action of acid to formulate a resist composition. The resist composition can minimize outgassing from a resist film during the EUV lithography and form a resist film having a hydrophilic surface sufficient to prevent formation of blob defects on the film after development.

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below. In the formula, R1 represents a hydrocarbon group of 4 to 20 carbon atoms which may have a substituent; Y1 represents a single bond or a divalent linking group; R2 and R3 each independently represents a substituent of 0 to 20 carbon atoms other than a fluorine atom; one of R2 and R3 may form a ring with Y1; Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.

The present invention relates to a developable bottom antireflective coating (BARC) composition and a pattern forming method using the BARC composition. The BARC composition includes a first polymer having a first carboxylic acid moiety, a hydroxy-containing alicyclic moiety, and a first chromophore moiety; a second polymer having a second carboxylic acid moiety, a hydroxy-containing acyclic moiety, and a second chromophore moiety; a crosslinking agent; and a radiation sensitive acid generator. The first and second chromophore moieties each absorb light at a wavelength from 100 nm to 400 nm. In the patterning forming method, a photoresist layer is formed over a BARC layer of the BARC composition. After exposure, unexposed regions of the photoresist layer and the BARC layer are selectively removed by a developer to form a patterned structure in the photoresist layer. The BARC composition and the pattern forming method are especially useful for implanting levels.

A method of tailoring the shape of a plurality of relief printing dots created in a photosensitive printing blank during a platemaking process including the steps of: (a) selectively exposing at least one photocurable layer to a source of actinic radiation to selectively crosslink and cure the at least one photocurable layer; and (b) developing the exposed at least one photocurable layer to reveal the relief image therein, said relief image comprising the plurality of relief printing dots. The source of actinic radiation comprises a source of UV light in the UV-A range and a source of light in the UV-C range. The at least one photocurable layer is simultaneously exposed to the source of UV light in the UV-A range and the source of UV light in the UV-C range to produce printing dots having at least one desired geometric characteristic.

A microstructure manufacturing method includes forming a layer of a photosensitive resin on a substrate surface having an electrical conductivity, forming a structure of the photosensitive resin by exposing the layer of the photosensitive resin to light and developing the layer of the photosensitive resin to expose a part of the substrate surface, forming a first plated layer on the exposed part of the substrate surface by soaking the structure of the photosensitive resin in a first plating solution, curing the structure of the photosensitive resin after forming the first plated layer, removing at least part of the first plated layer after curing the structure of the photosensitive resin, and forming a second plated layer on a part where the first plated layer is removed, by soaking the structure of the photosensitive resin in a second plating solution different from the first plating solution.

A method for forming patterns of a semiconductor device includes providing a photomask that includes an array of contact holes in an active region, a plurality of first dummy contact holes for restricting pattern distortion of the contact holes in an area outside of the array of the contact holes, a plurality of first assist features for restricting pattern distortion of the first dummy contact holes disposed inside a corresponding one of the first dummy contact holes, and an array of second assist features for additionally restricting pattern distortion of the first dummy contact holes. The array of second assist features is disposed outside of the first dummy contact holes. The method also includes forming an array of contact holes and first dummy contact holes on a wafer by using the photomask as an exposure mask.

A method of tilting liquid crystal molecules is presented. The method entails providing a substrate including a photoalignment layer on top of a layer of liquid crystal molecules. The photoalignment layer is exposed to patterned light that is incident on the substrate at a substantially normal angle. The patterned light is polarized in a polarization direction that is non-parallel to an incident surface of the substrate.

Disclosed is a resist ink having superior acid-resistance and coupling property, the resist ink composed of 70% or less by weight of solvent, 10-15% by weight of base polymer, 10-15% by weight of tacktifier, 3% or less by weight of additive, and 1-10% by weight of coupling agent.

A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Provided by the present invention is a method including: (1) forming a resist underlayer film on the upper face side of a substrate to be processed using a composition for forming a resist underlayer film, the composition containing (A) a compound having a group represented by the following formula (1); (2) forming a resist coating film by applying a resist composition on the resist underlayer film; (3) exposing the resist coating film by selectively irradiating the resist coating film with a radiation; (4) forming a resist pattern by developing the exposed resist coating film; and (5) forming a predetermined pattern on the substrate to be processed by sequentially dry etching the resist underlayer film and the substrate using the resist pattern as a mask.

A manufacturing method of an organic light emitting display device is disclosed which includes: forming a thin film transistor on each sub-pixel region which is defined in a substrate; forming a passivation layer on the substrate provided with the thin film transistor; forming a first electrode of an organic light emitting diode in each sub-pixel region of the passivation layer; forming a bank pattern in boundaries of the sub-pixel region of the passivation layer; forming a photoresist pattern, which exposes a first sub-pixel region, on the bank pattern; forming an organic light emission layer on the first electrode within the first sub-pixel region and an organic material layer on the photoresist pattern by depositing an organic material on the entire surface of the substrate provided with the photoresist pattern; and removing the photoresist pattern and the organic material pattern using a detachment film.

The present invention provides an exposure apparatus and an exposure method. The method comprises: utilizing an exposure light source to provide light rays to the photo-resist layer, wherein the light rays pass through the mask and the transparent substrate to reach the photo-resist layer; and utilizing a reflective plate to reflect the light rays passing through the transparent substrate and the photo-resist layer back to the photo-resist layer. The present invention can reduce a line space of a pattern of the photo-resist layer.

Provided is a method of producing an electrophotographic photosensitive member having improved sensitivity and capable of outputting an image having less image defects due to a ghost phenomenon not only under a normal-temperature, normal-humidity environment but also under a low-temperature, low-humidity environment as a particularly severe condition. The method of producing a gallium phthalocyanine crystal includes subjecting a gallium phthalocyanine and a specific amine compound, which are added to a solvent, to a milling treatment to perform crystal transformation of the gallium phthalocyanine. In addition, the gallium phthalocyanine crystal is used in the photosensitive layer of the electrophotographic photosensitive member.

A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Techniques for reducing the number of shots required by a radiation beam writing tool to write a pattern, such as fractured layout design, onto a substrate. One or more apertures are employed by a radiation beam writing tool to write a desired pattern onto a substrate using L-shaped images, T-shaped images, or some combination of both. By reducing the number of shots required to write a pattern onto a substrate, various implementations of the invention may reduce the write time and/or write complexity of the write process.

A mask blank for use in the manufacture of a binary mask adapted to be applied with ArF excimer laser exposure light has, on a transparent substrate, a light-shielding film for forming a transfer pattern. The light-shielding film has a laminated structure of a lower layer and an upper layer and has an optical density of 2.8 or more for exposure light and a thickness of 45 nm or less. The lower layer is made of a material in which the total content of a transition metal and silicon is 90 at % or more, and has a thickness of 30 nm or more. The upper layer has a thickness of 3 nm or more and 6 nm or less. The phase difference between exposure light transmitted through the light-shielding film and exposure light transmitted in air for a distance equal to the thickness of the light-shielding film is 30 degrees or less.

An automatic performance apparatus includes a memory device, an input device, a write device, a switching device, and a write control device. The memory device stores performance information. The input device inputs the performance information. The write device sequentially writes the performance information at predetermined addresses of the memory device on the basis of an operation of the input device. The switching device commands rewriting. In response to a command from the switching device, the write control device returns a write address of the memory device to an immediately preceding start point of a predetermined music composition unit having two or more notes, thereby enabling an easy and accurate edit of the once stored performance information.

For reading the frets of a stringed electronic musical instrument, a plurality of resistance wire strings are secured to a nut end and a bridge of the instrument, with the strings superposing in parallel relationship over a plurality of conducting frets mounted on a fingerboard on the instrument. The voltages produced by depressing the strings to the conducting frets, after being inverted and linearized, are quantized to levels representative of the particular frets to obviate the effects of contact resistance, and decision voltage levels are selected so as to account for such contact resistance. To enable the signals to be fed as conventional information through a MIDI channel to a synthesizer for generating frequencies corresponding to the signals, an analog to digital converter is used. The different components, as well as the digitized linearized signals, are selectively controlled and fed, respectively, to a microprocessor.

A stringed musical instrument comprises means by which the relation between displacement of a hinged string mounting member, such as a tremolo tail piece on which the tuners of the instrument are disposed, and the alteration of pitch of the strings thereof can be adjusted for each of the strings independently of the others. According to another feature of the invention the linear tuner blocks may be selectively released from engagement with the adjuster screws thereof for facilitating quick string mounting operations.

A tap dance platform for producing pitched sounds in response to energy imparted onto the surface of the platform having a flat base surface and parallel spaced-apart supports disposed on the flat base. Disposed on each of the spaced-apart supports are a plurality of flat spaced-apart keys which define a sound chamber between the base and the bottom of the keys. The supports are spaced-apart to engage the keys at their vibrational nodes. On the top surface of each of the spaced-apart supports are resilient strips to insulate the keys from the supports and the base to enhance the tonal sound. There are also provided side apertures in both the vertical supports and the side walls of the platform, to allow the sound to come out and to determine the desired sound quality. The ends of the platform are also recesses so that sound can travel out of each end of the platform. Thus, tap dancers can dance on the keys and create unique pitched, percussionlike sounds resembling a marimba.

An improved drum pedal for use with an acoustic or electronic bass drum has sprocket wheel 78 mounted for rotation on the toe end of a foot pedal 16. A rotational torque applied to a sprocket 72 attached to a crossarm 22 and in turn to a mallet head 28 causes mallet head 28 to swing through an arc 3 toward the drum head. Sprocket 72 and sprocket wheel 78 are connected by chain 76 in a compound pulley system wherein chain 76 is attached at one end to sprocket 72 and is wrapped around and under sprocket wheel 78 to be fixed at its other end at mounting bar 80, so that a downward motion of foot pedal 16 and sprocket wheel 78 through arc 2 moves sprocket 72 and mallet head 28 through arc 3, which motion is twice the magnitude in distance and velocity as that of sprocket wheel 78.

The invention concerns an action (1, 2) for a wind instrument, comprising keys (6) pivoted turnably relative to the body (3) of the instrument, holes (5) in the body being openable and closable with said keys according to the player's operation for producing notes of different pitch. A key action of this kind is found e.g. on the flute and on other woodwinds. As taught by the invention, the action comprises keys (6) which have been provided with magnets (12) so that the magnet returns the key that has turned into its initial position when the player ceases to press the key or the touch acting thereon. The keys (6) may be open keys which stay open by effect of mutually repulsing magnets (12) and close when pressed by the player against the repulsion of the magnets, or closed keys which are kept closed by mutually attracting magnets and open when pressed against the attraction of the magnets by the player, by touches connected with the keys.

A pedal mechanism for a bass drum, including a pivoted primary platform connected to a beater ball so that, when the primary platform is depressed, the beater ball moves to contact a drum; and a resiliently mounted secondary platform in operative contact with the primary platform, the arrangement being such that, in use, the toe of the drummer depresses the primary platform directly and the heel of the drummer depresses the primary platform through the secondary platform.

A tuning apparatus for a keyboard musical instrument, having a load applicator for applying a load of a predetermined value to a string set up in place, a calculating device for calculating a deviation between a displacement value of the string produced when the load is applied to the string and a preset value of displacement predetermined to give a required frequency of vibration, and a rotating device for turning a tuning pin until the deviation calculated by the calculating device is reduced to zero.

A method for electronically processing and storing musical information involves separating the musical information into a plurality of segments, each representing some portion of a measure, and assigning a sequential time dimension value to each segment. The musical information is also separated into plurality of channels, with each channel representing a sound source and having a sound dimension value assigned to it. The musical information for a given channel and segment is stored in a memory array by associating the musical information corresponding to a given channel and segment with the memory array node specified by the time dimension value and sound dimension value assigned to the given channel and segment.

In production of a casein-type artificial key material for keyboard musical instruments, fine grains of an elastomer such as polyurethane elastomer are added to a mixture to be kneaded together so that, in the structure of the product, islanded elastomer is uniformly dispersed in the matrix of casein. Inbred brittleness of casein is much improved by inclusion of the elastomer and strong bond between casein and the elastomer well removes the danger of interface separation.

The musical scale indicator according to a first preferred embodiment of the present invention is composed of two cooperating parts. A base is provided having thereon printed information pertaining to a particular musical instrument and which, in addition, has printed thereon fingering patterns for playing tones on that instrument arranged in a predetermined sequence indicative of any number of desired musical scales. A slidable, clear overlay is slidably connected with the base. The overlay has printed thereon the letter designations for the musical tones arranged in a predetermined sequence so as to cooperate with the fingering patterns indicated on the base in order to selectively indicate to the user the finger positions on the subject musical instrument that will produce the tones of a selected musical scale and simultaneously the finger positions on that instrument that will produce those tones.

A rotary valve assembly incorporated in a brass instrument for changing a pitch of a tone comprises a rotary valve housed in a valve casing having two groups of aeroports, and the rotary valve is provided with two air passages, one of which interconnects the aeroports in the first group and the other of which interconnects one aeroport of the first group and one aeroport of the second group, so that various arrangements are possible for the aeroports.

External sound signal coupled through a MIC IN terminal is fed through an operating switch panel section to an A/D converter for conversion to a digital signal. The digital signal is stored in a record memory through a waveform R/W controller under the control of a CPU. The digital signal stored in the record memory is read out from the CPU according to control data stored in a work memory to be fed to an external sound system for sounding.

A rotary valve for brass wind instruments with improved lubricating and durability properties is provided. The valve body 2 or both the valve body 2 and casing 1 of the rotary valve comprise(s) a machinable ceramic-resin composite material. The rotary valve can be readily produced by a method which comprises impregnating a machinable ceramic article containing substantially continuous micropores with a liquid resin material and hardening the resin material; machine-processing the resulting machinable ceramic-resin composite article into a shape of the valve body or shapes of the valve body and casing; and assembling the valve body into a rotary valve having the valve body 2 of the composite material rotatably contained in the casing 1 of the composite material or a metal material.

An animal call device includes a sound generator part and a sound amplifier part preferably directly connected to the sound generator part for producing an amplified and reverberating or echo-like animal call signal. The sound generator part includes a mouthpiece and a vibrating reed for producing staccato so-called grunt-like acoustic vibrations, particularly for attracting deer and similar mammals. A sound emitter member of the sound generator part is connected directly to a housing for the sound amplifier part which supports, in one embodiment, two spaced apart flexible diaphragms interconnected by a tension coil spring to produce complex echo-like amplified sounds. An alternate embodiment includes a single flexible diaphragm connected to a tension coil spring and supported in a frusto-conical housing for amplifying and modifying the staccato grunt signals produced by the sound generator part.

A sliding Capo for a musical instrument of the lute family which rides in a track in the neck of the instrument. The Capo includes a rigid cross piece holding elongated flanges which ride in the track. A cylindrical elastomeric roller runs in bearings carried by the cross piece, and adjustment means are provided for adjusting the height of the roller above the fingerboard. In the case of curved fingerboards, the shaft on which the roller runs is flexible and springy, so that it can bend and the cylindrical roller can press all strings to the fingerboard.

A microphone holder for mounting a microphone on a drum includes a vertical plate having an inner side surface which is adapted to face the drum, and a microphone connecting device, a clip member, and a positioning plate connected fixedly to the vertical plate. The microphone connecting device is adapted to hold the microphone thereon. The clip member clamps a vertical bolt that interconnects a drum body and a drum skin frame. The positioning plate is disposed above the clip member, and has a horizontal top plate section with a bottom surface that is adapted to abut against an upper end of the vertical bolt, and two vertical side plate sections which extend respectively and integrally from two opposite sides of the top plate section, and which are adapted to flank a projection on the drum skin frame through which the vertical bolt extends so as to prevent rotation of the clip member on the vertical bolt.

Apparatus and method for rotating an object using a music box mechanism having a spring motor. Apparatus includes a mechanical motor having a spring coupled between a body and a shaft of the music box where the shaft and the body are mounted for rotation relative to each other. The spring is windable by a user to store mechanical potential energy and when released, unwindable to release the stored energy and cause relative rotation between the body and the shaft. A base adapted for stationary placement against a surface such as a table or desktop or a wall or other stationary surface is fixedly coupled to or integrally formed with the shaft of the music box motor. An object such as a spherical planetary object or globe or any other object is connected to the body and includes an aperture or hole through which the base extends to the shaft. This aperture permits the object to rotate about the shaft without interference so that the body and the object rotate about the shaft as the spring unwinds. Connection of the winding mechanism shaft to the fixed base causes the body of the music box and attached object such as the globe to rotate.