A domestic appliance includes at least one component having a surface that can become laden with organic dirt. The surface includes a photocatalyst and is made from a primary-formed first material in which the photocatalyst is dispersed. A photoradiation source is provided for irradiating the photocatalyst with an activating electromagnetic radiation.

Provided is a method for cleaning the inside of a pressure tight container for a blasting treatment, wherein the inside of a pressure tight container can be cleaned for a short period of time after a blasting treatment. The method is comprised of a setting process wherein a cleaning blast (1) capable of cracking a part of a residual substance remaining on the inside of a pressure tight container (10), and a solid separating material (2) which collides with a substance bonded to an inner wall surface (32a) of the pressure tight container (10), to separate the bonded substance from the inner wall surface (32a) of the pressure tight container (10), are set on the inside of the pressure tight container (10); and a separation process wherein the cleaning blast (1) blasts on the inside of the pressure tight container (10), to crack a part of the residual substance remaining on the inside of the pressure tight container (10), and the separating material (2) is divided into a plurality of granular elements by the blast, so that the granular elements are spread, and collide with the bonded substance to remove the bonded substance.

A cleaning device may include a solution tank configured to store cleaning solution. The solution tank may include an inlet and an outlet. The cleaning device may include at least one discharge line filter in fluid communication with the solution tank and a pump having a pump intake and a pump discharge. The pump may be configured to direct cleaning solution from the solution tank outlet through the at least one discharge line filter. The cleaning device may include a cleaning head in fluid communication with the pump discharge and a bypass line in fluid communication with the pump discharge and the inlet. The bypass line may be configured to divert cleaning solution received from the pump discharge away from the cleaning head and toward the solution tank.

A compressor wash system for compressor washing includes stages of fluid delivery lines coupled at one end to a pump output and at the other end to a corresponding nozzle set. A control valve is connected to the fluid delivery line between the pump and the nozzle set, selectively supplying fluid between the pump and the nozzle set. Each nozzle of a nozzle set is positioned on an inlet of the compressor to allow the stages to wash a portion of the compressor. Nozzle sets are positioned around a bellmouth assembly and/or around an inlet cone of the compressor inlet, with a nozzle spray tip of each nozzle extending into an inlet air flow path of the compressor. Fluid may be directed to one or more of the stages in a sequencing pattern determined and configured to wash the compressor. Templates and installation guides are utilized to position the nozzles.

A system and method for securing tokens to be cleaned includes a tray with a curved surface defining a channel extending along a first direction and spacers projecting from the curved surface into the channel. The spacers are disposed at regular intervals along the first direction. The curved surface also has at least one opening. The tokens may be inserted into the channel between adjacent spacers and the tray holding the tokens can be submerged into a cleaning liquid. Identical trays containing tokens can also be stacked and together submerged into the cleaning liquid. The tray holding the tokens can be placed on a drying surface that has a drainage hole, and wetness remaining on the tokens can be sucked through the hole in the channel and the drainage hole by a vacuum or blown through the hole in the channel and drainage hole by an air blower.

Embodiments of the invention generally relate to a method for selectively etching or otherwise removing copper or other metallic contaminants from a substrate, such as a gallium arsenide wafer. In one embodiment, a method for selectively removing metallic contaminants from a substrate surface is provided which includes exposing a substrate to a peroxide clean solution, exposing the substrate to a hydroxide clean solution, and exposing the substrate to a selective etch solution containing potassium iodide, iodine, sulfuric acid, and water during a selective etch process. The substrate generally contains gallium arsenide material, such as crystalline gallium arsenide, and is usually a growth substrate for an epitaxial lift off (ELO) process. The copper or other metallic contaminants disposed on the substrate may be selectively etched at a rate of about 500 times, about 1,000 times, about 2,000 times, or about 4,000 times or greater than the gallium arsenide material.

A substrate rotates, and a liquid nozzle of a gas/liquid supply nozzle moves to a position above the center of the rotating substrate. In this state, a rinse liquid is discharged from the liquid nozzle onto the rotating substrate. The gas/liquid supply nozzle moves toward a position outside the substrate. A gas nozzle reaches the position above the center of the rotating substrate, so that the gas/liquid supply nozzle temporarily stops. With the gas/liquid supply nozzle stopping, an inert gas is discharged onto the center of the rotating substrate for a given period of time. After that, the gas/liquid supply nozzle again moves toward the position outside the substrate.

A method for cleaning a film separating device involves: a) performing positive-direction water cleaning when the ratio between the film filter resistance and the preliminary film filter resistance is less than 1.2; b) performing reverse water cleaning when the ratio between the film filter resistance and the preliminary film filter resistance is greater-than or equal-to 1.2; c) performing reverse chemical cleaning when the ratio between the film filter resistance and the preliminary film filter resistance is greater-than or equal-to 2; d) performing positive-direction chemical cleaning when the ratio between the film filter resistance and the preliminary film filter resistance is greater-than or equal-to 3.

A surface treatment composition of the present invention contains a first surfactant, a second surfactant, a basic compound, and water. The surface treatment composition has a pH of 8 or more. The second surfactant has a weight-average molecular weight one-half or less that of the first surfactant. The sum of the content of the first surfactant and the content of the second surfactant is 0.00001 to 0.1% by mass.

Water treatment compositions are provided that are effective for mitigating corrosion or fouling of surfaces in contact with aqueous systems. The water treatment compositions can include one or more azole compounds, one or more transition metals, and one or more dispersants, in addition to various other additives. The water treatment compositions can exclude phosphorus and still be effective. Methods for mitigating corrosion or fouling of a surface in an aqueous system are also provided.

A method for controlling thermal cycling of a faraday shield in a plasma process chamber is provided. The method includes: performing a first plasma processing operation on a first wafer in the plasma process chamber; terminating the first plasma processing operation; performing a first wafer transfer operation to transfer the first wafer out of the chamber; and, during the first wafer transfer operation, applying power to a TCP coil under a plasma limiting condition.

A warewashing detergent composition is provided for use for in cleaning of alkaline sensitive metals such as aluminum or aluminum containing alloys. The compositions include alternatives to sodium tripolyphosphate and/or other phosphorous containing raw materials, while retaining cleaning performance and corrosion prevention. According to the invention, high molecular weight polyacrylates (polyacrylic acid homopolymers) with a molecular weight of at least about 5000 are used as corrosion inhibitors and can be included for aluminum protection in a number of different detergent compositions.

A fluid applicator (20), for cleaning particles from a glass sheet (2), including a conveyor (40) for supporting the glass sheet, a conveyance plane, and a nozzle (24). The conveyance plane is disposed adjacent the conveyor so that when the glass sheet is conveyed by the conveyor, a surface (6) of the glass sheet is disposed in the conveyance plane. The nozzle has a longitudinal axis (23), wherein the longitudinal axis is disposed at an angle of 30 to 90 degrees with respect to the conveyance plane, and the nozzle is disposed at a distance (21) of less than or equal to 100 mm from the conveyance plane. Also, there is disclosed a method for cleaning particles from a glass sheet, using the fluid applicator. The fluid may be delivered to the nozzle at a pressure of 10 to 80 kg/cm2 and a flow rate of from 1 to 20 l/min.

A conveyor belt washer/dryer that includes a housing, which encloses a washing station separated by one or more spray barriers from a drying station. The housing has a passage that is sized and configured to allow the conveyor belt to successively pass through the washing station and the drying station. The washing station includes one or more washing heads, a splash plate and a reservoir. The washing heads discharge a wash liquid onto the top surface of the conveyor belt and the splash plate redirects the wash liquid onto the bottom surface. The reservoir collects the spent wash liquid. The drying station includes one or more air knife/knives that discharge(s) pressurized air onto the conveyor belt to dry the belt.

A method for processing a plurality of substrates after forming a photosensitive film on each substrate includes carrying each substrate into a placement buffer including a plurality of supporters by a first transport mechanism; taking out each substrate from the placement buffer to an interface by a second transport mechanism; carrying each substrate into the exposure device; carrying each substrate out of the exposure device into the placement buffer by the second transport mechanism; taking out each substrate from the placement buffer to the processing section by the first transport mechanism; performing development processing on each substrate; making each substrate stand by at the placement buffer based on timing at which the exposure device can accept each substrate; and making each substrate stand by at the placement buffer based on timing at which the developing device can accept each substrate.

An improved portable cleaning system for use in cleaning heat exchanger tube bundles, fin-fans, towers and other elongated components. The cleaning system comprises a cleaning unit having a cleaning enclosure that receives and cleans the component and a control unit that controls the operation of the system. The cleaning unit has a cleaning enclosure defining a chamber sized and configured to receive the component through a sealable lid. A roller assembly rotates the component while a spray assembly sprays cleaning fluid over and into the rotating component. The cleaning fluid is heated in the chamber using surface heating elements attached to heat transfer plates along sections of the chamber walls. A vapor recovery system captures and treats toxic vapors. In use, the cleaning system is transported to a facility to clean the components on-site using cleaning fluid supplied by the facility and discharging waste to the facility.

A dishwasher includes a dishwashing compartment and a rack provided in the dishwashing compartment for holding items to be cleaned. A rotatable spray arm is associated with the rack for applying water or wash liquor liquid upon the items. Water or wash liquor liquid is supplied to the spray arm via an upright supply tube having at least one region which flares in a direction of the spray arm and a peripheral terminal end facing the spray arm. The terminal end of the supply tube is configured to project into the cavity and thereby is extended into the spray arm.

A painting implement cleaning and storage apparatus 10 is provided. The apparatus facilitates the cleaning and storage of painting implements such as a roller 12, a brush 14 and a roller pan 16. The apparatus includes a base 18 and a bracket 32 coupled to the base. The roller 12 is supported on the bracket 32 in an upwardly extending diagonal position between shields 45 and 54 for containing paint spreads from the roller. The brush 14 is supported on bracket 32 in a upwardly projecting position. A roller pan 16 is coupable to shield 45 and supported thereon in a descending position. Once the painting implements 12, 14 and 16 are supported on the apparatus 10, cleaning can be accomplished by the application of a stream of water thereto after which the implements can be left until they are needed.

Embodiments of the present disclosure include cleaning processes, closed loop cleaning machines, and methods of cleaning an article. The cleaning process includes contacting a surface of an article with a cleaning composition in a cleaning chamber, where the cleaning composition includes at least about 85 percent by weight organic solvents, based on total weight of the cleaning composition, and where at least about 5 percent by weight of the organic solvents is propylene glycol, based on total weight of the organic solvents, to clean the surface of the article, collecting the cleaning composition including contaminants, and recovering the cleaning composition via distillation, where a distillation apparatus removes the contaminants from the cleaning composition and is connected to the cleaning chamber by a process stream.

A method of operating a dishwasher having a tub at least partially defining a treating chamber for receiving utensils and a spraying system spraying liquid in the treating chamber, to determine at least one parameter of the cycle of operation based on the set of load condition by selectively spraying liquid in multiple portions of the treating chamber.

A method for grit blasting tubes and for blowing swabs through tubes, automatically sensing that the swab has passed through the tube, and logging the event. Also, various methods are used for inserting the swabs into the tubes efficiently.

A dishwasher having a washing compartment; an air-guiding channel to generate an airflow; and a sorption drying system to dry items to be washed. The sorption drying system has a sorption compartment with reversibly dehydratable sorption material and the sorption compartment is connected to the washing compartment by the air-guiding channel. The reversibly dehydratable sorption material in the sorption compartment is layered in form of a sorption unit that has an inlet cross-sectional area such that the substantially identical respective air volume flow value that is applied to each entry point of the inlet cross-sectional area.

According to one embodiment, a reticle chuck cleaner for cleaning a reticle chuck of an EUV exposure apparatus includes a substrate having a shape to be carried to the reticle chuck of the EUV exposure apparatus, and an adhesive formed on one of the main surfaces of the substrate.

The invention meets the needs above by providing a surfactant system, mixture or blend that can be used as a part of a soaking composition. The surfactant system is capable of forming emulsions with, and thus removing, oily and greasy stains. In a preferred embodiment the surfactant compositions of the invention can remove non-trans fat and fatty acid stains. The invention involves foaming soaking compositions that have some or part of the anionic surfactant present in the same replaced with an extended chain anionic surfactant.

A cleaning machine for containers, containing a housing in which various treatment stations, including a feed station and a discharge station, are accommodated, whereby the housing has two side walls located opposite each other. In order to simplify the installation of the cleaning machine, a modular construction is used, whereby at least the discharge station is formed as a module.

Strategies for tool designs and their uses wherein the tools can operate in either closed or open modes of operation. The tools easily transition between open and closed modes on demand. According to one general strategy, environmentally controlled pathway(s) couple the ambient to one or more process chambers. Air amplification capabilities upstream from the process chamber(s) allow substantial flows of air to be introduced into the process chamber(s) on demand. Alternatively, the fluid pathways are easily closed, such as by simple valve actuation, to block egress to the ambient through these pathways. Alternative flows of nonambient fluids can then be introduced into the process chamber(s) via pathways that are at least partially in common with the pathways used for ambient air introduction. In other strategies, gap(s) between moveable components are sealed at least with flowing gas curtains rather than by relying only upon direct physical contact for sealing.

A method of cleaning an internal component (14) of a process vessel (10) includes opening a guide (42) extending at least from a vessel access port or entry nozzle (38) to the internal component (14), guiding a cleaning agent/device by means of the guide (42) to the internal component (14), cleaning the internal component (14) with the cleaning agent/device, and closing the guide (42). The process vessel (10) is then operated with the guide (42) remaining in the process vessel (10).

A device for cleaning and sanitizing a moving handrail, such as those found on escalators and moving walkways. The device can automatically and continuously sanitize a handrail as it moves past or through the device, thereby preventing the spread of germs and viruses and encouraging users to make contact with the handrail for safety reasons without worrying about disease transmission.

The invention relates to a cleaning system for coffee machines, comprising a cleaning device for periodically cleaning the coffee- and/or milk-carrying components using a cleaning liquid, which contains cleaning agent in the form of balls or tablets dissolved therein, wherein the cleaning device is provided with a time- and/or product-cycle-dependent controller and a metering apparatus (1) for the cleaning agent (10) that interacts with the controller. Thus, it is possible to program the cleaning process in a customized manner according to the mode of operation and to carry out the cleaning process fully automatically according to the program. The metering of the cleaning agent (10) according to the program ensures an always optimal cleaning effect together with sparing use of cleaning agents. Simple and safe handling is achieved by using ball- or tablet-shaped cleaning agents.

A steam cleaning apparatus including a main body having a main switch, a steam cleaning head coupled to the main body, and a position sensitive switch having a first state when the steam apparatus is in a substantially vertical storage position and a second state when the steam cleaning apparatus is in a tilted, cleaning position, the position sensitive switch being connected in electrical series with the main switch such that when the position-sensitive switch is in the first state the position-sensitive switch interrupts the flow of electrical current from the main switch and when the position-sensitive switch is in the second state, electrical power is supplied by the main switch.

This disclosure describes example antiseptic applicators that may be used in combination with one or more cleansing, antimicrobial and/or antiseptic agents to reduce or eliminate contaminates on a surface. According to some embodiments, the disclosure describes that the applicators may contain an impermeable layer and a permeable layer, where the impermeable layer prevents contaminates for transferring from a user's hand to the permeable layer and the surface.

A set of vertically stackable interacting cartridges for improving the delivery of biocide of a bulk feeder by positioning the stackable cartridges in a stacked condition within a chamber in the bulk feeder wherein the stackable cartridges are maintained in vertical interacting flow alignment with each other to provide enhanced control of the delivery of the biocide carried within each of the stackable cartridges without replacing the control valves of the bulk feeder.

A detergent for cleaning media is provided. The detergent comprises deionized water, between about 1% and about 5% by weight of a nonionic surfactant having an hydrophile/lipophile balance (HLB) value between about 10 and about 20, and an ethoxylation level between about 5 and about 20, between about 1% and about 5% by weight of a dispersing agent, between about 3% and about 10% by weight of a chelating agent comprising phosphonic acid, and between about 2% and about 6% by weight of an inorganic salt.

In a method for multiple cutoff machining a rare earth magnet block, a cutting fluid feed nozzle having a plurality of slits is combined with a plurality of cutoff abrasive blades coaxially mounted on a rotating shaft, each said blade comprising a base disk and a peripheral cutting part. The slits in the feed nozzle into which the outer peripheral portions of cutoff abrasive blades are inserted serve to restrict any axial run-out of the cutoff abrasive blades during rotation. Cutting fluid is fed from the feed nozzle through slits to the rotating cutoff abrasive blades and eventually to points of cutoff machining on the magnet block.

A body, such as a pick tool for cutting coal, includes a steel substrate and a hard face structure fused to the steel substrate. The hard face structure includes at least 1 weight percent Si, at least 5 weight percent Cr and at least 40 weight percent W. Substantially the balance of the hard face structure includes carbon and an iron group metal M selected from Fe, Co, Ni and alloy combinations of these elements. The hard face structure includes a plurality of elongate or platelike micro-structures having a mean length of at least 1 micron, a plurality of nano-particles having a mean size of less than 200 nanometers, and a binder material.

A wafer dicing blade includes a cutting part including a protrusion, the protrusion having a uniform region with a substantially uniform width, and a support covering at least one sidewall of the cutting part, the protrusion of the cutting part extending beyond an edge of the support.

An apparatus for splitting a plurality of masonry blocks is provided. The apparatus includes a plurality of first splitting blades that are configured to simultaneously move in a first direction, so as to split one of each of the plurality of masonry blocks into two or more sections during a single splitting operation. Each section has a first split surface. A plurality of second splitting blades is provided, where each is perpendicular and adjacent to one of the first splitting blades. Each of the second splitting blades is configured to form a second split surface on one of the masonry block sections that is perpendicular to at least one of the first split surfaces.

A saw (1) being portable and/or wheeled, such as a wall saw, floor saw or masonry saw, comprising a rotatable circular saw blade (3), a drive motor (5) with an motor output shaft (9) for rotating the saw blade (3), and a transmission (20) for interconnecting the motor output shaft (9) to the rotatable saw blade (3) in order to change an unsuitable high speed and low torque combination of the motor output shaft (9) into a more useable lower speed and higher torque combination at the rotatable tool (3), wherein the transmission (20) comprises two adjustable friction saw protective clutches in parallel, which can be set at a desired predetermined value, so as to limit the maximum size of the forces that the teeth and gears of the transmission (20) are exposed to. No over dimensioning is necessary, and the transmission (20) will make out fine in rough environments. The transmission may be of single-speed or two-speed type.

Methods, wires, and apparatus for use in cutting (e.g., slicing) hard, brittle materials is provided. The wire can be a super-abrasive wire that includes a wire core and super-abrasive particles bonded to the wire core via a metal bonding layer. This wire, or another type of wire, can be used to slice workpieces useful for producing wafers. The workpieces can be aligned within a holder to produce wafers using the device and methods presently provided. The holder rotates about its central axis, which translates to workpieces moving in orbit around this axis. A single abrasive wire, or multiple turns of wire stretched tightly between wire guides, is then contacted with the rotating holder to slice the workpieces.

Methods, wires, and apparatus for use in cutting (e.g., slicing) hard, brittle materials is provided. The wire can be a super-abrasive wire that includes a wire core and super-abrasive particles bonded to the wire core via a metal bonding layer. This wire, or another type of wire, can be used to slice workpieces useful for producing wafers. The workpieces can be aligned within a holder to produce wafers using the device and methods presently provided. The holder rotates about its central axis, which translates to workpieces moving in orbit around this axis. A single abrasive wire, or multiple turns of wire stretched tightly between wire guides, is then contacted with the rotating holder to slice the workpieces.

A device (20) for adjusting the blade guard holder (17) arranged on the saw arm (3) of a wall saw (1), having a coupling element (25) is provided, whereby a first end of the coupling element (25) is joined to the blade guard holder (17), and, in a locked state, a second end is joined to the saw arm (3).

A holding assembly is formed of a base having two primary support edges and two locking fingers. A cutting assembly is formed of a platform, a cutting band, and a plurality of rollers rotatable with respect to the platform for guiding the cutting band in a path of travel above the base. An advancement assembly is formed of rails coupled to and extending upwardly from the base. Slide blocks extend downwardly from the platform for advancing the platform and cutting band. Control components include pneumatic pivot pistons mounted on the base operable to move the fingers between operative and inoperative orientations, a pneumatic advancement piston for advancing and retracting the platform, and a hydraulic motor for rotating a roller to move the cutting band.

An apparatus, a system and a method may use a diamond-impregnated wire loop to cut an underwater pipeline. The apparatus may have a frame, a carriage attached to the frame and/or pulleys connected to the carriage. The diamond-impregnated wire loop may be connected to the pulleys. The carriage may move relative to the frame to direct the diamond-impregnated wire loop in a forward direction relative to the frame and/or through the pipeline.

A concrete saw is disclosed having a rigid metal frame, a hydraulic drive system, a water-cooled hub, and an axially rotatable trigger assembly comprising a 12 volt switch. The saw may include a hydraulic pump operable to supply pressurized hydraulic fluid to the drive system. In some embodiments, the saw may includes a flow sharing valve fluidly coupled to the hydraulic drive system to distribute the pressurized hydraulic fluid from the a hydraulic pump in a portable power pack. A method of removing trip hazards with the saw is also disclosed.

A method for slicing a plurality of wafers from a crystal includes providing a crystal of semiconductor material having a longitudinal axis, a cross section and at least one pulling edge. The crystal is fixed on a table and guided through a wire gang defined by sawing wire so as to form the wafers. The guiding is provided by a relative movement between the table and the wire gang such that entry sawing or exit sawing using the sawing wire occurs in a vicinity of the at least one pulling edge of the crystal.

Wear indicators for abrasive articles are presented. Specifically, indicator marks that are parallel to a bonding edge of a grinding element are presented. Tools comprising a carrier element and one or more grinding elements comprising one or more indicators are also presented.

The present invention provides a self-cleaning wiresaw cutting apparatus including a cleaning mechanism adapted to clean the components of the wiresaw before, during, or after a cutting process or to humidify the cutting region of the apparatus. The apparatus contains at least one dispenser adapted to dispense an aqueous fluid onto various components of the wiresaw.

A handheld engine-driven cutter is provided with a disk blade and a main body that drives the disk blade by an engine. A guard surface for repelling chips of a workpiece that scatter from the disk blade to below the main body is formed on the main body. The guard surface has an asymmetric shape with respect to a boundary that is a rotating plane of the disk blade.

A protective cover for a handheld power tool, with a tool that is at least partially surrounded by the protective cover, is formed of at least a first wall element and a second wall element, which in order to form a tool space are connected to each other in a parallel-spaced arrangement. The first wall element has a first circumferential section and the second wall element has a second circumferential section. The circumferential sections overlap each other and form a circumferential wall of the protective cover, with at least one opening which is provided in the outer-lying second circumferential section and under which the inner-lying first circumferential section extends.

A chop saw, grinding wheel, or like apparatus is disclosed herein also incorporated to an easily portable dust collection system. In a preferred embodiment, a worktable is provided with a center slot for receiving a circular saw blade. A negative pressure and resulting air flow is provided at the center slot to capture particulate matter as a byproduct of cutting the workpiece. Side slots are also disclosed to assist in particulate collection. A unique filter chamber having a cylindrical filter is additionally provided to remove dust from air and discharge the filtered air at a lateral side of the apparatus. A filter cleaning knob is additionally disclosed to assist in cleaning the filter. Of the beneficial aspects of the chop saw with dust collection system is its portability being one integral unit and the dust filter being easily cleaned and maintained.