1

DAC 2019 Preview – Multi-MHz Prototyping for Billion Gate Designs, AI, ML, 5G, Safety, Security and More

Vegas, here we come. All of us fun EDA engineers at once. Be prepared, next week’s Design Automation Conference will be busy! The trends I had outlined after last DAC in 2018—system design, cloud, and machine learning—have...(read more)




1

SIP to Allegro pcb designer 17.2 ver

Iam new to Package design SIP tool.

I had created the DIE package using SIP. Kindly give the direction how to map the created DIE package in Allegro pcb editor 17.2 ver.

In Allegro design capture CIS tool we had created the schematics file. The DIE which we are using is having 100pins, We had created the DIE in SIP tool. Out of 100 Die pins, only 90 pins is getting connected others are NC pins. We had mapped the Bond fingers only for 90 Die pins in the SIP package. But in the Schematics we had created the DIE logic symbol for 100 pins. Please advice whether we can able to import the DIE package in the allegro tool. In this scenario while importing the 100 pin DIE package in allegro pcb editor will the net connectivity will be shown from the DIE pad to Bond fingers and from Bond fingers to respective components? Please suggest whether we are going in the right path or please advice what we have to proceed with.

Thanks in Advance,

Rajesh




1

1G Mobile: AMPS, TOPS, C-450, Radiocom 2000, and All Those Japanese Ones

You can't read anything about technology these days without reading about 5G. But before there was 5G, there was 4G. And before that 3G, 2G, and 1G. A 0G even. For the next few Thursdays,...

[[ Click on the title to access the full blog on the Cadence Community site. ]]




1

2019 HF1 Release for Clarity, Celsius, and Sigrity Tools Now Available

The 2019 HF1 production release for Clarity, Celsius, and Sigrity Tools is now available for download at Cadence Downloads . SIGRITY2019 HF1 For information about supported platforms, compatibility...

[[ Click on the title to access the full blog on the Cadence Community site. ]]




1

Automotive Security in the World of Tomorrow - Part 1 of 2

Autonomous vehicles are coming. In a statistic from the U.S. Department of Transportation, about 37,000 people died in car accidents in the United States in 2018. Having safe, fully automatic vehicles could drastically reduce that number—but the trick is figuring out how to make an autonomous vehicle safe. Internet-enabled systems in cars are more common than ever, and it’s unlikely that the use of them will slow or stop—and while they provide many conveniences to a driver, they also represent another attack surface that a potential criminal could use to disable a vehicle while driving.

So—what’s being done to combat this? Green Hills Software is on the case, and they explained the landscape of security in automotive systems in a presentation given by Max Hinson in the Cadence Theater at DAC 2019. They have software embedded [FS1] in most parts of a car, and all the major OEMs use their tech. The challenge they’ve taken on is far from a simple one—between the sheer complexity of modern automotive computer systems, safety requirements like the ISO 26262 standard, and the cost to develop and deploy software, they’ve got their work cut out for them. It’s the complexity of the systems that represents the biggest challenge, though. The autonomous cars of the future have dynamic behaviors, cognitive networks, require security certification to at least ASIL-D, require cyber security like you’d have on an important regular computer system to cover for the internet-enabled systems—and all of this comes with a caveat: under current verification abilities, it’s not possible to test every test case for the autonomous system. You’d be looking at trillions of test cases to reach full coverage—not even the strongest emulation units can cover that today.

With regular cars, you could do testing with crash-test dummies, and ramming the car into walls at high speeds in a lab and studying the results. Today, though, that won’t cut it. Testing like that doesn’t see if a car has side-channel vulnerabilities in its infotainment system, or if it can tell the difference between a stop sign and a yield sign. While driving might seem simple enough to those of us that have been doing it for a long time, to a computer, the sheer number of variables is astounding. A regular person can easily filter what’s important and what’s not, but a machine learning system would have to learn all of that from scratch. Green Hills Software posits that it would take nine billion miles of driving for a machine learning system of today’s caliber to reach an average driver’s level—and for an autonomous car, “average” isn’t good enough. It has to be perfect.

A certifier for autonomous vehicles has a herculean task, then. And if that doesn’t sound hard enough, consider this: in modern machine-vision systems, something called the “single pixel hack” can be exploited to mess them up. Let’s say you have a stop sign, and a system designed to recognize that object as a stop sign. Randomly, you change one pixel of the image to a different color, and then check to see if the system still recognizes the stop sign. To a human, who knows that a stop sign is octagonal, red, and has “STOP” written in white block letters, a stop sign that’s half blue and maybe bent a bit out of shape is still, obviously, a stop sign—plus, we can use context clues to ascertain that sign at an intersection where there’s a white line on the pavement in front of our vehicle probably means we should stop. We can do this because we can process the factors that identify a stop sign “softly”—it’s okay if it’s not quite right; we know what it’s supposed to be. Having a computer do the same is much more difficult. What if the stop sign has graffiti on it? Will the system still recognize it as a stop sign? How big of an aberration needs to be present before the system no longer acknowledges the mostly-red, mostly-octagonal object that might at one point have had “stop” written on it as a stop sign? To us, a stop sign is a stop sign, even with one pixel changed—but change it in the right spot, and the computer might disagree.

The National Institute of Security and Technology tracks vulnerabilities along those lines in all sorts of systems; by their database, a major vulnerability is found in Linux every three days. And despite all our efforts to promote security, this isn’t a battle we’re winning right now—the number of vulnerabilities is increasing all the time.

Check back next time to see the other side: what does Green Hills Software propose we do about these problems? Read part 2 now.




1

New Incisive Low-Power Verification for CPF and IEEE 1801 / UPF

On May 7, 2013 Cadence announced a 30% productivity gain in the June 2013 Incisive Enterprise Simulator 13.1 release.  Advanced debug visualization, faster turn-around time, and the extension of eight years of low-power verification innovation to IEEE 1801/UPF are the key capabilities in the release.

When we talk about low-power verification its easy to equate it with simulation.  For certain, simulation is the heart of a low-power verification solution. Simulation enables engineers to run their design in the context of power intent.  The challenge is that a simulation-only approach is inadequate. For example, if engineers could achieve SoC quality by verifying the individual function of each power control module (PCM), then simulation could be enough.  For a single power domain, simulation can be enough. 

However, when the SoC has multiple power domains -- and we have seen SoCs with hundreds of them -- engineers have to check the PCMs and all of the arcs between the power modes.  These SoCs often synchronize some of the domain switching to reduce overall complexity, creating the potential for signal skew errors on the control signals for the connected domains.  Managing these complexities requires verification methodologies including advanced debug, verification planning, assertion-based verification, Universal Verification Methodology - Low Power (UVM-LP), and more (see Figure 1).

 

Figure 1:  Comprehensive Low-Power Verification 

But even advanced verification methodologies on top of simulation aren't enough.  For example, the state machine that defines the legal and illegal power mode transitions is often written in software. The speed and capacity of the Palladium emulation platform is ideal to verify in this context, and it is integrated with simulation sharing debug, UVM acceleration, and static checks for low-power. And, it reports verification progress into a holistic plan for the SoC.  Another example is the ability to compare the design in the implementation flow with the design running in simulation to make sure that what we verify is what we intend to build.

Taken together, verification across multiple engines provides the comprehensive low-power verification needed for today's advanced node SoCs.  That's the heart of this low-power verification announcement. 

Another point you may have noticed is the extension of the Common Power Format (CPF) based power-aware support in the Incisive Enterprise Simulator to IEEE 1801.  We chose to bring IEEE 1801 to simulation first because users like you sometimes need to mix vendors for regression flows.  Over time, Cadence will extend the low-power capabilities throughout its product suite to IEEE 1801.

If you are using CPF today, you already have the best low-power solution. The evidence is clear:  the upcoming IEEE 1801-2013 update includes many of the CPF features contributed to 1801/UPF to enable methodology convergence.  Since you already have those features in the CPF flow, any migration before you have a mature IEEE 1801-2013 tool flow would reduce the functionality you have today.

If you are using Unified Power Format (UPF) 1.0 today, you want to start planning your move toward the IEEE 1801-2013 standard.  A good first step would be to move to the IEEE 1801-2009 standard.  It fills holes in the earlier UPF 1.0 definition.  While it does lack key features in -2013, it is an improvement that will make the migration to -2013 easier. The Incisive 13.1 release will run both UPF 1.0 and IEEE 1801-2009 power intent today.

Over the next few weeks you'll see more technical blogs about the low-power capabilities coming in the Incisive 13.1 release.  You can also join us on June 19 for a webinar that will introduce those capabilities using the reference design supplied with the Incisive Enterprise Simulator release.

=Adam "The Jouler" Sherer

(Yes, "Sherilog" is still here.  :-) )




1

Insider Story of the New IEEE 1801-2013 (UPF 2.1) Standard

The IEEE has announced the publication of the new 1801-2013 standard, also known as UPF 2.1, and immediate availability for free download through the IEEE 1801-2013 Get Program. Even though the standard is new to the whole world, for the people of the IEEE working group this standard is finally done and is in the past now.

There is a Chinese saying "好事多磨" which means "good things take time to happen." I forgot the exact time when I first joined the working group for the new standard -- about two and half years ago -- but I do remember long hours of meetings and many "lively" debates and discussions. Since the "hard time" has passed us, I would like to share some fun facts about the working group and the standard.

  • The 1801 working group is the largest entity based ballot group in IEEE-SA history.
  • The new standard was initially planned for 2012, but was delayed purely due to the large amount of work required.
  • At one point, the group was debating on whether the new standard should be called UPF 2.1 or 3.0. It may sound weird now but we spent quite some time discussing this. Eventually we settled on 2.1 as it was the original plan.
  • The 1801-2013 document has 358 pages which is 53% thicker than previous version (the sheer amount of changes in the new standard indicate that this is more than just a normal incremental update of the previous version as suggested by naming it 2.1)
  • Around 300 real issues were reported over the previous version and a majority of them were fixed in the new release.
  • This is the first release with constructs and semantics coming from Common Power Format (CPF), a sign of convergence of the two industry leading power formats.
  • There are about 100 working group meetings in my Outlook calendar since 2011, with meeting times ranging from 2 hours to 8 hours.
  • We extensively used Google Drive (which was called Google Docs when the working group started), a great tool for productivity. I cannot imagine how any standard could have been done before Google existed!

Personally, I had an enjoyable journey, especially from having the privilege to work with many industry experts who are all passionate about low power. I do have one more thing to share though. My older daughter went from middle school to high school during the period of the development of the new standard. Since most of the meetings took place in the early morning California time, she had to endure the pain of listening to all these discussions on power domain, power switches, etc. on her way to school.

I asked her if she learned anything. She told me that other than being able to recognize the voices of Erich, John and Joe on the line, she also learned that she would never want to become an electrical or computer engineer! She was so happy that the meetings stopped a couple of months ago. But what I did not tell her is that the meetings will resume after DAC! Well, I am sure this will be a big motivation for her to get her own driving license in the summer.

If you want to get some quick technical insights into the new standard, check out my recent EE Times article IEEE 1801-2013: A bold step towards power format convergence.

Qi Wang

 




1

Low-Power IEEE 1801 / UPF Simulation Rapid Adoption Kit Now Available

There is no better way other than a self-help training kit -- (rapid adoption kit, or RAK) -- to demonstrate the Incisive Enterprise Simulator's IEEE 1801 / UPF low-power features and its usage. The features include:

  • Unique SimVision debugging 
  • Patent-pending power supply network visualization and debugging
  • Tcl extensions for LP debugging
  • Support for Liberty file power description
  • Standby mode support
  • Support for Verilog, VHDL, and mixed language
  • Automatic understanding of complex feedthroughs
  • Replay of initial blocks
  • ‘x' corruption for integers and enumerated types
  • Automatic understanding of loop variables
  • Automatic support for analog interconnections

 

Mickey Rodriguez, AVS Staff Solutions Engineer has developed a low power UPF-based RAK, which is now available on Cadence Online Support for you to download.

  • This rapid adoption kit illustrates Incisive Enterprise Simulator (IES) support for the IEEE 1801 power intent standard. 

Patent-Pending Power Supply Network Browser. (Only available with the LP option to IES)

  • In addition to an overview of IES features, SimVision and Tcl debug features, a lab is provided to give the user an opportunity to try these out.

The complete RAK and associated overview presentation can be downloaded from our SoC and Functional Verification RAK page:

Rapid Adoption Kits

Overview

RAK Database

Introduction to IEEE-1801 Low Power Simulation

View

Download (2.3 MB)

 

We are covering the following technologies through our RAKs at this moment:

Synthesis, Test and Verification flow
Encounter Digital Implementation (EDI) System and Sign-off Flow
Virtuoso Custom IC and Sign-off Flow
Silicon-Package-Board Design
Verification IP
SOC and IP level Functional Verification
System level verification and validation with Palladium XP

Please visit https://support.cadence.com/raks to download your copy of RAK.

We will continue to provide self-help content on Cadence Online Support, your 24/7 partner for learning more about Cadence tools, technologies, and methodologies as well as getting help in resolving issues related to Cadence software. If you are signed up for e-mail notifications, you're likely to notice new solutions, application notes (technical papers), videos, manuals, etc.

Note: To access the above documents, click a link and use your Cadence credentials to log on to the Cadence Online Support https://support.cadence.com/ website.

Happy Learning!

Sumeet Aggarwal and Adam Sherer




1

IEEE 1801/UPF Tutorial from Accellera—Watch and Learn

If you weren't able to attend the 2013 DVCon, you missed out on a great IEEE 1801/UPF tutorial delivered by members of the IEEE committee. Accellera had the event recorded and that recording is now posted on the Accellera.org website. Regardless of your work so far with low power design and verification, you need to watch this video.

Power management is becoming ubiquitous in our world. The popular aspect is that reduced power is good for the evironment and that is true. But for those teams that have been building chips around the 40nm node and below, there is another truth. Power management is required simply to get working silicon in many cases. As the industry expands the number of designs with power management and forges deeper into advanced nodes, we steadily identify improvements to the power format descriptions. The most recent set of imporvements to the IEEE 1801 standard are now available in the 2013 version of that standard.

To help bring the standard to life, five representatives from the IEEE joined to deliver a tutorial at DVCon in 2013. Qi Wang (Cadence), Erich Marschner (Mentor), Jeffrey Lee (Synopsys), John Biggs (ARM), and Sushma Honnavarra-Prasad (Broadcom) each contributed to the tutorial. It started with a review of the UPF basics that led to the IEEE 1801 standard delivered by the EDA companies. The IEEE 1801 users then presented tutorial content on how to apply the standard. The session then concluded with a look forward to the IEEE 1801-2013 (UPF 2.1) standard. The standard was released two months after the DVCon tutorial and is available through the Accellera Get program.

So after the bowl games are over and you'vre returned through the woods and back over the river from Grandma's, grab a cup of hot cocoa and learn more about the power standards you may well be using in 2014.

Regards,

Adam "The Jouler" Sherer




1

ST Microelectronics Success with IEEE 1801 / UPF Incisive Simulation - Video

ST Microelectronics reported their success with IEEE 1801 / UPF low-power simulation using Incisive Enterprise Simulator at CDNLive India in November 2013. We were able to meet with Mohit Jain just after his presentation and recorded this video that explains the key points in his paper.

With eight years of experience and pioneering technology in native low-power simulation, Mohit was able to apply Incisive Enterprise Simulator to a low-power demonstrator in preparation for use with a production set-top box chip.  Mohit was impressed with the ease in which he was able to reuse his existing IEEE 1801 / UPF code successfully, including the power format files and the macro models coded in his Liberty files. Mohit also discusses how he used the power-aware Cadence SimVision debugger.

The Cadence low-power verification solution for IEEE 1801 / UPF also incorporates the patent-pending Power Supply Network visualization in the SimVision debugger.  You can learn more about that in the Incisive low-power verification Rapid Adoption Kit for IEEE 1801 / UPF here in Cadence Online Support.

Just another happy Cadence low-power verification user!

Regards,

 Adam "The Jouler" Sherer 




1

mixer pxf simulation error(IC5141,Cadence workshop document)

Hello

The document I referenced is https://filebox.ece.vt.edu/~symort/rfworkshop/Mixer_workshop_instruction.pdf. (This is cadence workshop document)

While following the pxf simulation in the above article, the results are different and I have a question.

My result picture is shown below.

<my result error>

<document result>

<my direct plot>

<document direct plot>

The difference with the documentation is that in the direct plot screen after the pxf simulation,

1.output harmonics-> input sideband

2.Frequency axis: out-> frequency axis: absin

3.The results for port0 (RF port) are also different (see photo below).

4.The frequency values in the box are different.

My screen shows 5G, 10G, 1K ~ 10M, but the document is the same as 1K ~ 10M.

Ask for a solution. Thank you.




1

E- (SPMHDB-187): SHAPE boundary may not cross itself.

Hi experts,

I have a problem with my design as below

ERROR: in SHAPE (-2.3622 2.3622)

  class = ETCH
  subclass = TOP 
  Part of Symbol Def SHAPE_4725X4725.
      Which is part of a padstack as a SHAPE symbol.
  ERROR(SPMHDB-187): SHAPE boundary may not cross itself.
   Error cannot be fixed.
       Object has first point location at (-2.3622 2.3622).

Can you tell me how to solve my problem?

Thanks a lot.




1

Skill : Draw Line 17.2 works , 17.4 doesn't

Hi , 

I am sharing with you some simple skill script that draw line in user layer :

axlCmdRegister("DrawLine" 'DrawLine)
procedure(DrawLine()
   layer_name = "substrate geometry/userlayer"
   mypopup = axlUIPopupDefine(nil '(
      ("Done" "axlDBTransactionCommit(mark), axlFinishEnterFun()")
      ("Oops" "axlDBTransactionOops(mark), when(zerop(--oopsNum)")
      ("Cancel" "axlDBTransactionRollback(mark), axlCancelEnterFun()")
      ("MENU_SEPARATOR", nil)))
   axlUIPopupSet( mypopup)
   ; Clear the dynamic buffer
   axlClearDynamics()

   if(axlLayerGet(layer_name) != nil then
      if(axlIsVisibleLayer(layer_name) == nil then
         axlVisibleLayer(layer_name,t)
         axlVisibleUpdate(t)
      );End if
   else
      if(axlLayerGet("substrate geometry") == nil then
         layer_name = "board geometry/userlayer"
         axlLayerCreateNonConductor(layer_name)
         axlVisibleLayer(layer_name,t)
         axlVisibleUpdate(t)
      else
         axlLayerCreateNonConductor(layer_name)
         axlVisibleLayer(layer_name,t)
         axlVisibleUpdate(t)
      );End if
   );End if

   ; Clear mypath to nil, then loop gathering user picks:
   mypath = nil
   mark = axlDBTransactionStart()
   flag = t
   allP = list(nil)
   seg1 = nil
   seg2 = nil
   while( (mypath = axlEnterPath(?lastPath mypath))
      if(flag == t then
         p = axlDBCreatePath(mypath, layer_name)
         seg1 = car(car(car(p))->segments)
         seg2 = car(cdr(car(car(p))->segments))
         path = axlPathStart( list(car(seg1->startEnd)) , 0)
         axlPathLine( path , 0 , car(cdr(seg1->startEnd)))
         if(seg2 then
            axlPathLine( path , 0 , car(cdr(seg2->startEnd)))
         );end if
         flag = nil
      else
         p = axlDBCreatePath(mypath, layer_name)
         seg1 = car(car(car(p))->segments)
         seg2 = car(cdr(car(car(p))->segments))
         axlPathLine( path , 0 , car(cdr(seg1->startEnd)))
         if(seg2 then
            axlPathLine( path , 0 , car(cdr(seg2->startEnd)))
         );end if
      );end if
      allP = cons(car(car(p)) allP)
   );Loop
   axlDBCreatePath(path, layer_name)
   forall( x allP axlDeleteObject(x))
);End procedure

Is anyone can help to understand why this script can work with 16.5/16.6/17.2 and doesn't work with 17.4 ?

To be more informative in 17.4 this script behaves differently , when i am trying to draw line i can't zoom in/out ,i can't use my shortcuts to snap it on segment/middle/edge , it's like it's waiting only for next X/Y user click , all other functions just disabled .

Thanks .




1

Creating a circle at 10 mil air gap from a pin

Hi, I'm trying to create a circle from a pin with 10 mil air gap and at 45 degree rotation. The problem that im facing is that, I'm unable to get the bBox upper left coordinates. Because I want my circle to be placed from that coordinate with a 10 mil air gap. And the pins are "regular" and are placed on "Etch/Top" Layer. Kindly help me in solving this issue.




1

How to refer the library compiled by INCISIVE 13.20 in Xcelium 19.30

Hi,

I am facing this elaboration error when using Xcelium:

Command>

    xmverilog -v200x +access+r +xm64bit -f vlist -reflib plib -timescale 1ns/1ps

Log>

    xmelab: *E,CUVMUR (<name>.v,538|18): instance 'LUTP0.C GLAT3' of design unit 'tlatntscad12' is unresolved in 'worklib.LUTP0:v'.

I guess the plib was not referred to as the simulation configuration because the tlatntscad12 is included in plib.

The plib is compiled by INCISIVE 13.20 and I am using the Xcelium 19.30.

Please tell me the correct command on how to refer to the library directory compiled by different versions.

Thank you,




1

Extrowords #100: Generalissimo 71

Sample clues

17 across: Beckham speciality (4,4)

4 down: Havana speciality (5)

19 across: Infamous 1988 commercial against Michael Dukakis (9,4)

11 down: Precisely (2,3,3)

13 down: City infamously ransacked by the Japanese in 1937 (7)

Extrowords © 2007 IndiaUncut.com. All rights reserved.
India Uncut * The IU Blog * Rave Out * Extrowords * Workoutable * Linkastic




1

Extrowords #101: Generalissimo 72

Sample clues

11 across: Chandigarh’s is 0172 (3,4)

21 across: He’s a loser, baby (4)

1 down: Garment meant to shape the torso (6)

12 down: It’s slogan: “Life, Liberty and the Pursuit” (8)

18 down: Noise made by badminton players? (6)

Extrowords © 2007 IndiaUncut.com. All rights reserved.
India Uncut * The IU Blog * Rave Out * Extrowords * Workoutable * Linkastic




1

Extrowords #102: Generalissimo 73

Sample clues

5 across: The US president’s bird (3,5,3)

11 down: Group once known as the Quarrymen (7)

10 across: Cavalry sword (5)

19 across: Masonic ritual (5,6)

1 down: Pioneer of Ostpolitik (6)

Extrowords © 2007 IndiaUncut.com. All rights reserved.
India Uncut * The IU Blog * Rave Out * Extrowords * Workoutable * Linkastic




1

Extrowords #103: Generalissimo 74

Sample clues

14 across: FDR’s baby (3,4)

1 down: A glitch in the Matrix? (4,2)

4 down: Slanted character (6)

5 down: New Year’s venue in New York (5,6)

16 down: Atmosphere of melancholy (5)

Extrowords © 2007 IndiaUncut.com. All rights reserved.
India Uncut * The IU Blog * Rave Out * Extrowords * Workoutable * Linkastic




1

Extrowords #104: Generalissimo 74

Sample clues

6 across: Alejandro González Iñárritu’s breakthrough film (6,6)

19 across: Soft leather shoe (8)

7 down: Randroids, for example (12)

12 down: First American World Chess Champion (7)

17 down: Circle of influence (5)

Extrowords © 2007 IndiaUncut.com. All rights reserved.
India Uncut * The IU Blog * Rave Out * Extrowords * Workoutable * Linkastic




1

Extrowords #105: Generalissimo 75

Sample clues

5 across: Robbie Robertson song about Richard Manuel (6,5)

2 down: F5 on a keyboard (7)

10 across: Lionel Richie hit (5)

3 down: ALTAIR, for example (5)

16 down: The problem with Florida 2000 (5)

Extrowords © 2007 IndiaUncut.com. All rights reserved.
India Uncut * The IU Blog * Rave Out * Extrowords * Workoutable * Linkastic




1

Extrowords #106: Generalissimo 76

Sample clues

9 across: Van Morrison classic from Moondance (7)

6 down: Order beginning with ‘A’ (12)

6 across: Fatal weakness (8,4)

19 across: Rolling Stones classic (12)

4 down: Massacre tool (8)

Extrowords © 2007 IndiaUncut.com. All rights reserved.
India Uncut * The IU Blog * Rave Out * Extrowords * Workoutable * Linkastic




1

Error: CMFBC-1 The schematic and the layout constraints were not synchronized

Hi, I am in the middle of a design and had no problem going back and forth between schematics and layout. Now I am getting the error message below. I am using Cadence 17.2.

ERROR: Layout database has probably been reverted to an earlier version than that, which was used in the latest flow or the schematic database was synchronized with another board.

The basecopy file generated by the last back-to-front flow not found.

ERROR: Layout database has probably been reverted to an earlier version than that, which was used in the latest flow or the schematic database was synchronized with another board.

The basecopy file generated by the last back-to-front flow not found.

Error: CMFBC-1: The schematic and the layout constraints were not synchronized as the changes done since the last sync up could not be reconciled. Syncing the current version of the schematic or layout databases with a previous version would result in this issue. The  constraint difference report is displayed.

Continuing with "changes-only" processing may result in incorrect constraint updates.

Thanks for your input

Claudia




1

ORCAD 17.2 Win 10 Install Error

I'm trying to re-install ORCAD 17.2  in a PC from a DVD which I have upgraded from Win 7 to Win 10 and  now has a new 500GB SSD. While installing I got a Windows Application Error  0xc000007b. When I try to run ORCAD I get the same Error.

Looking for ways to fix this problem.




1

Extracting 1dB bandwidth from parametric sweep-DFT results

Hi all,

I am using ADE assembler.

I ran transient simulation and swept the input frequency (Fin) of the circuit. And I use Spectrum Measurement to return a value of the fundamental tone magnitude (Sig_fund) for each sweep point. 

Previously, I use "plot across design points" to plot both "Fin" and "Sig_fund", and then use "Y vs Y" to get a waveform of Sig_fund vs Fin. Measure the 1dB Bandwidth with markers. 

Can I realized above measurement with an expression in "output setup" ? And how?

I know to set the "Eval type" to "sweep" to process the data across sweep points. But here, it has to return an interpolated value from "Fin" with a criteria "(value(calcVal("Sig_fund"  0) - 1)". I am not sure whether it can be done in ADE assembler.

Thanks and regards,

Yutao




1

Help!!, Spectre error: Illegal library definition found in netlist for TSMC 180nm

Dear All,
When I want to start simulation with spectre the error says:
Fatal error: Illegal library definition found in netlist
I set the model file correctly, but I don't know why it errors!
I opened the ADE>>Setup>>Model library
and I tried to modify the path of models file (SCS files)
It gives me "Illegal library definition found in netlist"
Thanks.




1

ERROR (OSSGLD-18): and not able to run simulation

I put some stimulus in the simulation file section : 

_vpd_data_enb (pu_data_enb 0) vsource wave=[0 0 1n 0 1.015n vcchbm 3n vcchbm] dc=0 type=pwl
_vpu_data_enb (pd_data_enb 0) vsource dc=pu_enb type=dc

I get the following error. 

ERROR (OSSGLD-18): The command character after '[' in the NLP expression '[0 0 1n 0 1.015n vcchbm 3n vcchbm] dc=0 type=pwl

' is not a valid

character. The command character is the first character after '[' in the NLP

expression. It must be '?', '!', '#', '$', 'n', '@', '.', '~' or '+'. Enter a

valid character as the command character.

si: simin did not complete successfully.

 

I dont see anything wrong with the stimulus syntax




1

Five Reasons I'm Excited About Mixed-Signal Verification in 2015

Key Findings: Many more design teams will be reaching the mixed-signal methodology tipping point in 2015. That means you need to have a (verification) plan, and measure and execute against it.

As 2014 draws to a close, it is time to look ahead to the coming years and make a plan. While the macro view of the chip design world shows that is has been a mixed-signal world for a long time, it is has been primarily the digital teams that have rapidly evolved design and verification practices over the past decade. Well, I claim that is about to change. 2015 will be a watershed year for many more design teams because of the following factors:

  • 85% of designs are mixed signal, and it is going to stay that way (there is no turning back)
  • Advanced node drives new techniques, but they will be applied on all nodes
  • Equilibrium of mixed-signal designs being challenged, complexity raises risk level
  • Tipping point signs are evident and pervasive, things are going to change
  • The convergence of “big A” and “big D” demands true mixed-signal practices

Reason 1: Mixed-signal is dominant

To begin the examination of what is going to change and why, let’s start with what is not changing. IBS reports that mixed signal accounts for over 85% of chip design starts in 2014, and that percentage will rise, and hold steady at 85% in the coming years. It is a mixed-signal world and there is no turning back!

 

Figure 1. IBS: Mixed-signal design starts as percent of total

The foundational nature of mixed-signal designs in the semiconductor industry is well established. The reason it is exciting is that a stable foundation provides a platform for driving change. (It’s hard to drive on crumbling infrastructure.  If you’re from California, you know what I mean, between the potholes on the highways and the earthquakes and everything.)

Reason 2: Innovation in many directions, mostly mixed-signal applications

While the challenges being felt at the advanced nodes, such as double patterning and adoption of FinFET devices, have slowed some from following onto to nodes past 28nm, innovation has just turned in different directions. Applications for Internet of Things, automotive, and medical all have strong mixed-signal elements in their semiconductor content value proposition. What is critical to recognize is that many of the design techniques that were initially driven by advanced-node programs have merit across the spectrum of active semiconductor process technologies. For example, digitally controlled, calibrated, and compensated analog IP, along with power-reducing mutli-supply domains, power shut-off, and state retention are being applied in many programs on “legacy” nodes.

Another graph from IBS shows that the design starts at 45nm and below will continue to grow at a healthy pace.  The data also shows that nodes from 65nm and larger will continue to comprise a strong majority of the overall starts. 


Figure 2.  IBS: Design starts per process node

TSMC made a comprehensive announcement in September related to “wearables” and the Internet of Things. From their press release:

TSMC’s ultra-low power process lineup expands from the existing 0.18-micron extremely low leakage (0.18eLL) and 90-nanometer ultra low leakage (90uLL) nodes, and 16-nanometer FinFET technology, to new offerings of 55-nanometer ultra-low power (55ULP), 40ULP and 28ULP, which support processing speeds of up to 1.2GHz. The wide spectrum of ultra-low power processes from 0.18-micron to 16-nanometer FinFET is ideally suited for a variety of smart and power-efficient applications in the IoT and wearable device markets. Radio frequency and embedded Flash memory capabilities are also available in 0.18um to 40nm ultra-low power technologies, enabling system level integration for smaller form factors as well as facilitating wireless connections among IoT products.

Compared with their previous low-power generations, TSMC’s ultra-low power processes can further reduce operating voltages by 20% to 30% to lower both active power and standby power consumption and enable significant increases in battery life—by 2X to 10X—when much smaller batteries are demanded in IoT/wearable applications.

The focus on power is quite evident and this means that all of the power management and reduction techniques used in advanced node designs will be coming to legacy nodes soon.

Integration and miniaturization are being pursued from the system-level in, as well as from the process side. Techniques for power reduction and system energy efficiency are central to innovations under way.  For mixed-signal program teams, this means there is an added dimension of complexity in the verification task. If this dimension is not methodologically addressed, the level of risk adds a new dimension as well.

Reason 3: Trends are pushing the limits of established design practices

Risk is the bane of every engineer, but without risk there is no progress. And, sometimes the amount of risk is not something that can be controlled. Figure 3 shows some of the forces at work that cause design teams to undertake more risk than they would ideally like. With price and form factor as primary value elements in many growing markets, integration of analog front-end (AFE) with digital processing is becoming commonplace.  

 

Figure 3.  Trends pushing mixed-signal out of equilibrium

The move to the sweet spot of manufacturing at 28nm enables more integration, while providing excellent power and performance parameters with the best cost per transistor. Variation becomes great and harder to control. For analog design, this means more digital assistance for calibration and compensation. For greatest flexibility and resiliency, many will opt for embedding a microcontroller to perform the analog control functions in software. Finally, the first wave of leaders have already crossed the methodology bridge into true mixed-signal design and verification; those who do not follow are destined to fall farther behind.

Reason 4: The tipping point accelerants are catching fire

The factors cited in Reason 3 all have a technical grounding that serves to create pain in the chip-development process. The more factors that are present, the harder it is to ignore the pain and get the treatment relief  afforded by adopting known best practices for truly mixed-signal design (versus divide and conquer along analog and digital lines design).

In the past design performance was measured in MHz with simple static timing and power analysis. Design flows were conveniently partitioned, literally and figuratively, along analog and digital boundaries. Today, however, there are gigahertz digital signals that interact at the package and board level in analog-like ways. New, dynamic power analysis methods enabled by advanced library characterization must be melded into new design flows. These flows comprehend the growing amount of feedback between analog and digital functions that are becoming so interlocked as to be inseparable. This interlock necessitates design flows that include metrics-driven and software-driven testbenches, cross fabric analysis, electrically aware design, and database interoperability across analog and digital design environments.


Figure 4.  Tipping point indicators

Energy efficiency is a universal driver at this point.  Be it cost of ownership in the data center or battery life in a cell phone or wearable device, using less power creates more value in end products. However, layering multiple energy management and optimization techniques on top of complex mixed-signal designs adds yet more complexity demanding adoption of “modern” mixed-signal design practices.

Reason 5: Convergence of analog and digital design

Divide and conquer is always a powerful tool for complexity management.  However, as the number of interactions across the divide increase, the sub-optimality of those frontiers becomes more evident. Convergence is the name of the game.  Just as analog and digital elements of chips are converging, so will the industry practices associated with dealing with the converged world.


Figure 5. Convergence drivers

Truly mixed-signal design is a discipline that unites the analog and digital domains. That means that there is a common/shared data set (versus forcing a single cockpit or user model on everyone). 

In verification the modern saying is “start with the end in mind”. That means creating a formal approach to the plan of what will be test, how it will be tested, and metrics for success of the tests. Organizing the mechanics of testbench development using the Unified Verification Methodology (UVM) has proven benefits. The mixed-signal elements of SoC verification are not exempted from those benefits.

Competition is growing more fierce in the world for semiconductor design teams. Not being equipped with the best-known practices creates a competitive deficit that is hard to overcome with just hard work. As the landscape of IC content drives to a more energy-efficient mixed-signal nature, the mounting risk posed by old methodologies may cause causalities in the coming year. Better to move forward with haste and create a position of strength from which differentiation and excellence in execution can be forged.

Summary

2015 is going to be a banner year for mixed-signal design and verification methodologies. Those that have forged ahead are in a position of execution advantage. Those that have not will be scrambling to catch up, but with the benefits of following a path that has been proven by many market leaders.



  • uvm
  • mixed signal design
  • Metric-Driven-Verification
  • Mixed Signal Verification
  • MDV-UVM-MS

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